公开(公告)号：WO2019192841A1

公开(公告)日：2019-10-10

申请号：PCT/EP2019/056898

申请日：2019-03-20

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Kevin, Weimin ,  PURVIS, Michael, Anthony ,  STINSON, Cory, Alan

IPC: H05G2/00

Abstract: A system includes a spatial modulation device configured to interact with a light beam to create a modified light beam, the modified light beam including a spatial pattern of light that has a non-uniform intensity along a direction that is perpendicular to a direction of propagation of the modified light beam, the spatial pattern of light including one or more components of light; and a target supply system configured to provide a target to a target region, the target including target material that, when in a plasma state, emits EUV light. The target region overlaps with the beam path such that at least some of the one or more components of light in the modified beam interact with a portion of the target.

公开(公告)号：WO2021204481A1

公开(公告)日：2021-10-14

申请号：PCT/EP2021/055958

申请日：2021-03-10

Applicant: ASML NETHERLANDS B.V.

Inventor： ROKITSKI, Rostislav ,  CONKLIN, Philip M. ,  STINSON, Cory, Alan ,  SCHAFGANS, Alexander, Anthony ,  LIEBENBERG, Christoffel, Johannes

IPC: H01S3/23 ,  H01S3/223 ,  H01S3/00 ,  H01S3/10

Abstract: Systems, apparatuses, and methods are provided for dual-pass amplification of laser beams along a common beam path. An example method can include generating a first laser beam and a second laser beam. Subsequently, the example method can include performing dual-pass amplification of the first laser beam and the second laser beam along a common beam path. In some aspects, the first laser beam can include a first wavelength, the second laser beam can include a second wavelength different from the first wavelength.

公开(公告)号：WO2018128740A1

公开(公告)日：2018-07-12

申请号：PCT/US2017/064555

申请日：2017-12-04

Applicant: ASML NETHERLANDS B.V.

Inventor： CONKLIN, Philip, M ,  STINSON, Cory, Alan

IPC: G02B27/42 ,  G02B27/09 ,  H01S3/00 ,  H01S3/10 ,  H05G2/00

Abstract: A system for an extreme ultraviolet (EUV) light source includes a light-generation system configured to emit one or more light beams onto a beam path; one or more optical amplifiers, each of the one or more amplifiers including a gain medium on the beam path, each gain medium being configured to amplify the one or more light beams to produce one or more amplified light beams; and one or more diffractive optical elements on the beam path, where each of the one or more diffractive optical elements has a plurality of focal lengths, and each focal length of the diffractive optical element is associated with a particular polarization state.

公开(公告)号：WO2018052909A1

公开(公告)日：2018-03-22

申请号：PCT/US2017/051208

申请日：2017-09-12

Applicant: ASML NETHERLANDS B.V.

Inventor： PRICE, Michael, Leslie ,  MITRY, Mark, Joseph ,  STINSON, Cory, Alan

IPC: H05G2/00 ,  G03F7/20

Abstract: A method is described for measuring a moving property of a target. The method includes: forming a remaining plasma that at least partially coincides with an extended target region, the remaining plasma being a plasma formed from an interaction between a prior target and a prior radiation pulse in a target space; releasing a current target along a trajectory toward the target space that is at least partly overlapping the extended target region; determining one or more moving properties of the current target when the current target is within the extended target region and after a prior and adjacent target has interacted with a prior radiation pulse in the target space; and if any of the determined one or more moving properties of the current target are outside an acceptable range, then adjusting one or more characteristics of a radiation pulse directed toward the target space.

Abstract translation: 描述了用于测量目标的移动性质的方法。 该方法包括：形成至少部分与扩展目标区域重合的剩余等离子体，剩余等离子体是由在目标空间中的先前目标与先前辐射脉冲之间的相互作用形成的等离子体; 沿着朝向至少部分与扩展目标区域重叠的目标空间的轨迹释放当前目标; 当所述当前目标处于所述扩展目标区域内时，并且在先前和相邻目标已经与所述目标空间中的先前辐射脉冲相互作用之后，确定所述当前目标的一个或多个运动特性; 并且如果当前目标的所确定的一个或多个移动特性中的任何一个在可接受范围之外，则调整指向目标空间的辐射脉冲的一个或多个特性。