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公开(公告)号:WO2021180473A1
公开(公告)日:2021-09-16
申请号:PCT/EP2021/054623
申请日:2021-02-25
Applicant: ASML NETHERLANDS B.V.
Inventor: ZHANG, Jian , WANG, Yan , TANG, Ljiang , WANG, Yixiang
Abstract: An improved leveling sensor and method for adjusting a sample height in a charged-particle beam inspection system are disclosed. An improved leveling sensor comprises a light source configured to project a first pattern onto a sample and a detector configured to capture an image of a projected pattern after the first pattern is projected on the sample. The first pattern can comprise an irregularity to enable a determination of a vertical displacement of the sample.