公开(公告)号：WO2016202519A1

公开(公告)日：2016-12-22

申请号：PCT/EP2016/061236

申请日：2016-05-19

Applicant: ASML NETHERLANDS B.V.

Inventor： DE BEST, Jeroen, Johannes, Theodorus, Hendrikus ,  AANGENENT, Wilhelmus, Henricus, Theodorus, Maria ,  VAN DER MEULEN, Stan, Henricus

IPC: G05B11/14 ,  G03F7/20

CPC classification number: G03F7/70725 ,  G05B11/14

Abstract: The present invention relates to a control system configured to control a parameter (F) of a dynamic system, wherein the parameter depends on an output signal (g(F(k))). The control system comprises a set-point generator and a feedforward, wherein the set-point generator is arranged to provide a set-point signal (F(k)) to the feedforward. The feedforward is arranged to provide the output signal based on the set-point signal, wherein the feedforward is arranged to perform a non-linear operation on the set-point signal. The non-linear operation is based on a non-linear functional relationship between the output signal and the parameter.

Abstract translation: 本发明涉及一种被配置为控制动态系统的参数（F）的控制系统，其中参数取决于输出信号（g（F（k）））。 所述控制系统包括设定点发生器和前馈，其中所述设定点发生器被布置成向所述前馈提供设定点信号（F（k））。 前馈被布置为基于设定点信号提供输出信号，其中前馈被布置为对设定点信号执行非线性操作。 非线性运算基于输出信号与参数之间的非线性函数关系。

公开(公告)号：WO2021023464A1

公开(公告)日：2021-02-11

申请号：PCT/EP2020/069346

申请日：2020-07-09

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE WIJDEVEN, Jeroen, Johan, Maarten ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  STARREVELD, Jeroen, Pieter ,  VAN DER MEULEN, Stan, Henricus

IPC: F16F1/02 ,  F16F1/13 ,  G03F7/20

Abstract: The invention provides a support (1) comprising: • - a first end portion (2) and a second end portion (3) wherein the second end portion (3) is on the side opposite to the first end portion (2) in a longitudinal direction of the support, • - a coil spring (4) which is arranged between the first end portion (2) and the second end portion (3) which coil spring (4) comprises: • - a first spiral member (5) which extends between the first end portion (2) and the second end portion (3) in a circumferential direction of the support (1), and • - a second spiral member (6) which extends between the first end portion (2) and the second end portion (3) in a circumferential direction of the support (1), wherein the first spiral member (5) of the coil spring and the second spiral member (6) of the coil spring (4) are moveable relative to each other, wherein the support (1) further comprises a damper device (20) which is attached to the first spiral member (5).

公开(公告)号：WO2018041599A1

公开(公告)日：2018-03-08

申请号：PCT/EP2017/070394

申请日：2017-08-11

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER MEULEN, Frits ,  ARLEMARK, Erik, Johan ,  COX, Hendrikus, Herman, Marie ,  CUIJPERS, Martinus, Agnes, Willem ,  DE HOOGH, Joost ,  DE VRIES, Gosse, Charles ,  DE WIT, Paul , Corné, Henri ,  DERKS, Sander, Catharina, Reinier ,  GIJZEN, Ronald, Cornelis, Gerardus ,  HEMSCHOOTE, Dries, Vaast, Paul ,  HOOGENDAM, Christiaan, Alexander ,  KOEVOETS, Adrianus, Hendrik ,  LAFARRE, Raymond, Wilhelmus, Louis ,  LEROUX, Alain, Louis, Claude ,  LIMPENS, Patrick, Willem, Paul ,  OVERKAMP, Jim, Vincent ,  VALENTIN, Christiaan, Louis ,  VAN BERKEL, Koos ,  VAN DER MEULEN, Stan, Henricus ,  VAN DER SANDEN, Jacobus, Cornelis, Gerardus ,  VAN DER SCHOOT, Harmen, Klaas ,  VLES, David, Ferdinand ,  WESTERHUIS, Evert, Auke, Rinze

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Abstract translation: 一种光刻设备，包括投影系统，所述投影系统被配置成投影图案化的辐射束以在保持在衬底台上的衬底上形成曝光区域，所述光刻设备还包括用于冷却所述衬底的冷却设备，其中 冷却装置包括位于衬底台上方并且与暴露区域相邻的冷却元件，冷却元件被配置为从衬底去除热量。

公开(公告)号：WO2018015121A1

公开(公告)日：2018-01-25

申请号：PCT/EP2017/066087

申请日：2017-06-29

Applicant: ASML NETHERLANDS B.V.

Inventor： JEUNINK, Andre, Bernardus ,  VAN BOKHOVEN, Laurentius, Johannes, Adrianus ,  VAN DER MEULEN, Stan, Henricus ,  HUANG, Yang-Shan ,  LA TORRE, Federico ,  MOEST, Bearrach ,  KEIJ, Stefan, Carolus, Jacobus, Antonius ,  VAN DEN BRINK, Enno ,  SCHOUTEN, Christine, Henriette ,  TOLSMA, Hoite, Pieter, Theodoor

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

Abstract translation: 一种光刻设备，包括构造成支撑图案形成装置和相关联的薄膜的支撑结构，所述图案形成装置能够在辐射束的横截面上赋予图案以形成图案化的辐射束， 以及投影系统，其被配置为将图案化的辐射束投影到衬底的目标部分上，其中所述支撑结构位于壳体中，并且其中压力传感器位于壳体中。