公开(公告)号：WO2021180493A1

公开(公告)日：2021-09-16

申请号：PCT/EP2021/054953

申请日：2021-02-26

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN WEPEREN, Ilse ,  NIENHUYS, Han-Kwang ,  COENEN, Teis, Johan

IPC: G03F7/20

Abstract: Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances, an estimation of the parameter at one or more further times.

公开(公告)号：WO2021259646A1

公开(公告)日：2021-12-30

申请号：PCT/EP2021/065540

申请日：2021-06-09

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： VAN WEPEREN, Ilse ,  BEUKMAN, Arjan, Johannes, Anton ,  SWILLAM, Mohamed ,  KREUZER, Justin, Lloyd ,  ROUX, Stephen

IPC: G01N21/95 ,  G01N21/956 ,  G03F1/84 ,  G01N2021/95676

Abstract: Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.

公开(公告)号：WO2023285322A1

公开(公告)日：2023-01-19

申请号：PCT/EP2022/069165

申请日：2022-07-08

Applicant: ASML NETHERLANDS B.V.

Inventor： BEUKMAN, Arjan, Johannes, Anton ,  VAN WEPEREN, Ilse

IPC: G03F9/00

Abstract: Disclosed is a method for measuring alignment on an alignment mark, and associated apparatuses. The method comprises illuminating the alignment mark with illumination comprising at least one wavelength; capturing the scattered radiation scattered from the alignment mark as a result of said illumination step, and determining at least one position value for said alignment mark from an angularly resolved representation of said scattered radiation, wherein said alignment mark, or a feature thereof, is smaller than said at least one wavelength in at least one dimension of a substrate plane.

公开(公告)号：WO2021180540A1

公开(公告)日：2021-09-16

申请号：PCT/EP2021/055316

申请日：2021-03-03

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN WEPEREN, Ilse ,  NIENHUYS, Han-Kwang ,  COENEN, Teis, Johan

IPC: G03F7/20

Abstract: Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances, an estimation of the parameter at one or more further times.