公开(公告)号：WO2021023602A1

公开(公告)日：2021-02-11

申请号：PCT/EP2020/071449

申请日：2020-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： SHAYEGAN SALEK, Mir Farrokh ,  HOWELL, Rafael C. ,  ZHENG, Yunan ,  WEI, Haiqing ,  CAO, Yu

IPC: G03F7/20 ,  G03F7/70283 ,  G03F7/705

Abstract: A method of simulating a pattern to be imaged onto a substrate using a photolithography system, includes obtaining a pattern to be imaged onto the substrate, smoothing the pattern, and simulating an image of the smoothed pattern. The smoothing may include application of a graphical low pass filter and the simulating may include application of edge filters from an edge filter library.