公开(公告)号：WO2023088595A1

公开(公告)日：2023-05-25

申请号：PCT/EP2022/076457

申请日：2022-09-22

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DRENT, William, Peter ,  DUVALL, Wyatt ,  SWERDLOW, Ethan, Marcus ,  ZIMMERMAN, Oliver

IPC: H05G2/00

Abstract: The present invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising a reservoir system including a reservoir (410) configured to be connected to an ejection system (450) via an outlet (410a) of the reservoir and a pressurizing system to pressurize solid target material in the reservoir, wherein the apparatus further comprises a heating system (440) arranged between the reservoir and the ejection system to liquify the solid target material after being pressurized in the reservoir, and wherein the pressurizing system is configured to provide a pressure to the solid target material in the reservoir in order to extrude the solid target material through the outlet such that the liquid target material entering the ejection system is at a pressure of at least (200) bar.