公开(公告)号：WO2017102380A1

公开(公告)日：2017-06-22

申请号：PCT/EP2016/079599

申请日：2016-12-02

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： VLES, David, Ferdinand ,  ABEGG, Erik, Achilles ,  BENDIKSEN, Aage ,  BROUNS, Derk, Servatius, Gertruda ,  GOVIL, Pradeep K. ,  JANSSEN, Paul ,  NASALEVICH, Maxim, Aleksandrovich ,  NOTENBOOM, Arnoud, Willem ,  PÉTER, Mária ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VOORTHUIJZEN, Willem-Pieter ,  WILEY, James, Norman

IPC: G03F1/62 ,  G03F7/20 ,  G03F1/22

CPC classification number: G03F7/70916 ,  G03F1/22 ,  G03F1/62 ,  G03F7/7085 ,  G03F7/70983

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

Abstract translation: 适用于光刻设备的图案形成装置的薄膜。 所述薄膜包括至少一个破损区域，所述破坏区域被配置为在光刻设备的正常使用期间优先破坏所述薄膜的其余区域之前破裂。 至少一个破裂区域包括薄膜的与周围薄膜区域相比厚度减小的区域。