公开(公告)号：WO2016079051A3

公开(公告)日：2016-09-22

申请号：PCT/EP2015076687

申请日：2015-11-16

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： KRUIZINGA MATTHIAS ,  JANSEN MAARTEN MATHIJS MARINUS ,  AZEREDO LIMA JORGE MANUEL ,  BOGAART ERIK WILLEM ,  BROUNS DERK SERVATIUS GERTRUDA ,  BRUIJN MARC ,  BRULS RICHARD JOSEPH ,  DEKKERS JEROEN ,  JANSSEN PAUL ,  KAMALI MOHAMMAD REZA ,  KRAMER RONALD HARM GUNTHER ,  LANSBERGEN ROBERT GABRIËL MARIA ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIPSON MATTHEW ,  LOOPSTRA ERIK ROELOF ,  LYONS JOSEPH H ,  ROUX STEPHEN ,  VAN DEN BOSCH GERRIT ,  VAN DEN HEIJKANT SANDER ,  VAN DER GRAAF SANDRA ,  VAN DER MEULEN FRITS ,  VAN LOO JÉRÔME FRANÇOIS SYLVAIN VIRGILE ,  VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN

IPC: G03F1/62 ,  G03F1/00 ,  G03F7/20

CPC classification number: G03F7/70983 ,  G03F1/64 ,  G03F7/70825

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract translation: 适用于光刻过程的掩模组件，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述支架被构造成相对于所述图案形成装置悬挂所述薄膜框架，使得所述薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。