公开(公告)号：WO2002065213A1

公开(公告)日：2002-08-22

申请号：PCT/US2001/042992

申请日：2001-11-07

Applicant: ASML US, INC.

Inventor： HELMUS, June, L. ,  MCCULLOUGH, Andrew, W.

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70883 ,  G03F7/70933

Abstract: The present invention provides a method and system for controlling the refractive index of gaseous mixture of the projection optics of a lithographic tool. In one embodiment, the present invetion corrects projection optic aberrations due to altitude specific barometric pressure variations. Furthermore, the present invetion provides control over the aberrations of an optical system, the ability to compensate for altitude changes, teh ability to compensate for pressure changes, and the ability to purge gases fro teh optical system. In an embodiment, the system of the present inveiton includes at least one gas supply to provide a gas for a mixture, at least one mass flow controller associated with each gas supple, where the mass flow controller measures and controls the quantity of a respective gas for the mixture, and at least one flow gauge, or filter arrangement, to substantially maintain laminar flow within the lithography apparatus. According to another embodiment of the present invention, the system further includes at least one filter to purify each gas for each gas supply, and at least one temperature control unit to maintain the temperature of the mixture at predetermined thermal specifications.

Abstract translation: 本发明提供了一种用于控制光刻工具的投影光学器件的气体混合物的折射率的方法和系统。 在一个实施例中，由于高度特异性大气压力变化，本投影校正投影光学像差。 此外，本次投入提供对光学系统的像差的控制，补偿高度变化的能力，补偿压力变化的能力以及清除光学系统中的气体的能力。 在一个实施例中，本发明的系统包括至少一个气体供应以提供用于混合物的气体，至少一个与每个气体柔性相关联的质量流量控制器，其中质量流量控制器测量和控制相应气体的量 以及至少一个流量计或过滤器装置，以基本维持光刻设备内的层流。 根据本发明的另一个实施例，系统还包括至少一个净化每个气体供应源的气体的过滤器和至少一个温度控制单元，以将混合物的温度保持在预定的热规格。