-
1.发明申请SYSTEM AND METHOD FOR FABRICATING MINIATURE STRUCTURES ON A FLEXIBLE SUBSTRATE 审中-公开用于在柔性基板上制作微小结构的系统和方法
公开(公告)号：WO2015143428A1
公开(公告)日：2015-09-24
申请号：PCT/US2015/021992
申请日：2015-03-23
发明人： BERG, John, S.
IPC分类号： G01B11/00
CPC分类号： G03F7/0002
摘要： A system for the fabrication of patterned miniature structures, such integrated circuits, includes a continuous, flexible substrate that is transported by rollers to a series of processing stations. To ensure proper alignment amongst the various stations, the substrate is provided with at least one fiducial that is raised above its top surface a height that maximizes optical contrast when viewed interferometrically. At least one processing station includes an optical device that is capable of both interferometrically identifying the fiducial for alignment purposes and subsequently illuminating the substrate with a modifiable light pattern as part of a photolithographic process. Fiducials can also be used to identify gross geometric variances in the substrate caused by external factors, such as heat and moisture. In turn, a web adjustment element can be used to apply selective heat or tension to the substrate in order to correct such geometric variances.
摘要翻译： 用于制造图案化微型结构的系统，这种集成电路包括通过辊传送到一系列处理站的连续的柔性基板。 为了确保各个站之间的正确对准，基板设置有至少一个基准，其在其顶表面上方升高，当以干涉方式观察时，使得光学对比度最大化的高度。 至少一个处理站包括能够干涉地识别用于对准目的的基准的光学装置，并随后用作为光刻工艺的一部分的可修改的光图案照射衬底。 也可以使用基准来识别外部因素（如热量和水分）引起的基底几何差异。 反过来，卷筒纸调节元件可以用于对基材施加选择性的热或张力，以便校正这种几何方差。
-
公开(公告)号：WO2018191383A1
公开(公告)日：2018-10-18
申请号：PCT/US2018/027118
申请日：2018-04-11
摘要： A system for manufacturing a cylindrical, nanoimprint lithography master includes, in one embodiment, a flat master coated with a first layer of compliant photopolymer material, a cylindrical master with an outer sleeve formed from a second layer of compliant photopolymer material, and a light source. The cylindrical master is disposed in tangential contact against the flat master such that the first and second layers of compliant material exhibit 5%-20% compressive strain within the region of contact. Through such pressure, the feature pattern in the flat master is imprinted into the first layer of material. Light from the light source is acutely focused into a narrow curing zone within the contact region. Curing causes the first layer of photopolymer material to bond to the outer sleeve. Through geometric matching and synchronized movement between the flat and cylindrical masters, the cylindrical master can be patterned about its periphery without creating a seam.
-
公开(公告)号：WO2021108656A1
公开(公告)日：2021-06-03
申请号：PCT/US2020/062352
申请日：2020-11-25
发明人： BEANE, Daniel , BERG, John, S. , BENCHEV, Dimitur
IPC分类号： C23C16/54 , C23C16/00 , C23C16/44 , C23C16/455 , C23C16/458 , H01L21/20
摘要： An atomic layer deposition system for depositing thin layers of material onto a common substrate includes a deposition head shaped to define a conical interior cavity into which a conical deposition dram is disposed. Together, the deposition head and the deposition dram define a narrow gap adapted to receive the common substrate, the spacing of the narrow gap being adjustable through acute axial displacement of the deposition head relative to the deposition dram. A pair of rollers advances the substrate through the gap in a first direction, as the deposition head rotates in the opposite direction at a precise rate. Each of the deposition head and deposition dram includes a plurality of separate fluid channels which enable gasses utilized in the deposition process to be delivered into and exhausted from the narrow gap, with the delivery of inert gas on both sides of the substrate effectively creating an air bearing.
-
4.发明申请
公开(公告)号：WO2019165435A1
公开(公告)日：2019-08-29
申请号：PCT/US2019/019605
申请日：2019-02-26
摘要： A system for constructing a roller-type nanoimprint lithography (RNIL) master comprises a master fabrication tool positioned in relation to a metal sleeve which is axially mounted on a rotatable drum. As part of the manufacturing process, the metal sleeve is applied with a layer of photoresist. Then, a laser writing instrument for the master fabrication tool exposes the photoresist in a defined, controller-regulated pattern using highly-focused pulses of light. Using alignment fiducials on the metal sleeve for registration, the laser writing instrument sensitizes the photoresist in a designated pattern as the rotatable drum continuously moves both rotationally and linearly about its longitudinal axis. In connection with one manufacturing process, the photoresist is sensitized at variable depths by modifying the number, duration and intensity of light pulses emitted. Thereafter, light-sensitized photoresist is removed during a development step, with the remaining photoresist hardened and coated to yield a high-precision feature pattern.
-
-
-
搜索结果
4 条记录 (耗时 0.009 秒)
