公开(公告)号：WO2022197415A1

公开(公告)日：2022-09-22

申请号：PCT/US2022/017725

申请日：2022-02-24

Applicant: CYMER, LLC

Inventor： BURDT, Russell, Allen ,  GUVINDAN RAJU, Kumar, Raja ,  MINAKAIS, Matthew ,  MANLEY, David, Wesley

IPC: G03F7/20 ,  G05B23/02 ,  G06N20/00 ,  H01L21/66

Abstract: Systems for maintaining light sources for semiconductor photolithography in which a module making up part of the light source is evaluated at various pulse counts to produce a binary prediction as to whether the module is sufficiently likely to operate without failure in an ensuing sequence of pulses. The binary prediction may be made by a machine learning model trained on metrics extracted from measurements taken on deinstalled modules. A group of models, each trained differently, can be made available according to a selection made by the user or according to the maintenance objectives of the user.