PHOTOPOLYMERIZABLE SILICONE MATERIALS FORMING SEMIPERMEABLE MEMBRANES FOR SENSOR APPLICATIONS
    1.
    发明申请
    PHOTOPOLYMERIZABLE SILICONE MATERIALS FORMING SEMIPERMEABLE MEMBRANES FOR SENSOR APPLICATIONS 审中-公开
    形成用于传感器应用的可切换膜的可光聚合硅材料

    公开(公告)号:WO2006023037A3

    公开(公告)日:2008-01-17

    申请号:PCT/US2005021768

    申请日:2005-06-21

    摘要: A method for preparing sensing devices (biosensors) includes the steps of: (1) applying a photopatternable silicone composition to a surface in a sensing device to form a film, (2) photopatterning the film by a process comprising exposing the film to radiation through a photomask without the use of a photoresist to produce an exposed film; (3) removing regions of the non-exposed film with a developing solvent to form a patterned film, which forms a permselective layer or an analyte attenuation layer covering preselected areas of the sensing device.

    摘要翻译: 用于制备感测装置(生物传感器)的方法包括以下步骤:(1)将光可图案化的硅氧烷组合物施加到感测装置中的表面以形成膜,(2)通过包括将膜暴露于辐射的方法对该膜进行光图案化 光掩模,而不使用光致抗蚀剂以产生曝光的膜; (3)用显影溶剂去除未曝光的膜的区域以形成图案化膜,其形成覆盖感测装置的预选区域的选择性选择层或分析物衰减层。

    LITHOGRAPHY PROCESSES USING PHASE CHANGE COMPOSITIONS
    3.
    发明申请
    LITHOGRAPHY PROCESSES USING PHASE CHANGE COMPOSITIONS 审中-公开
    使用相变组合物的光刻工艺

    公开(公告)号:WO2006041645A3

    公开(公告)日:2006-07-20

    申请号:PCT/US2005034044

    申请日:2005-09-23

    IPC分类号: G03F7/00

    摘要: A lithography method includes the steps of: A) filling a mold having a patterned surface with a phase change composition at a temperature above the phase change temperature of the phase change composition; B) hardening the phase change composition to form a patterned feature; C) separating the mold and the patterned feature; optionally D) etching the patterned feature; optionally E) cleaning the mold; and optionally F) repeating steps A) to D) reusing the mold. The PCC may include an organofunctional silicone wax.

    摘要翻译: 一种光刻方法包括以下步骤:A)在高于相变组合物的相变温度的温度下用相变组合物填充具有图案化表面的模具; B)硬化相变组合物以形成图案化特征; C)分离模具和图案化特征; 任选地D)蚀刻所述图案化的特征; 可选地E)清洁模具; 并且可选地,F)重复步骤A)至D)再利用模具。 PCC可以包含有机官能硅氧烷蜡。

    EPOXY FORMULATIONS FOR USE IN LITHOGRAPHY TECHNIQUES
    5.
    发明申请
    EPOXY FORMULATIONS FOR USE IN LITHOGRAPHY TECHNIQUES 审中-公开
    环氧化合物在利用LITHOGRAPHY技术中的应用

    公开(公告)号:WO2007087399B1

    公开(公告)日:2007-10-04

    申请号:PCT/US2007002034

    申请日:2007-01-23

    摘要: A method for preparing a patterned feature includes the steps of I) casting a curable silicone composition against a master, II) curing the curable silicone composition to form a silicone mold, II) separating the master and the silicone mold, IV) filling a silicone mold having a patterned surface with a curable epoxy formulation; V) curing the curable epoxy formulation to form a patterned feature; VI) separating the silicone mold and the patterned feature; optionally VIII) etching the patterned feature; optionally IX) cleaning the silicone mold; and optionally X) repeating steps IV) to IX) reusing the silicone mold.

    摘要翻译: 制备图案特征的方法包括以下步骤:I)将可固化的聚硅氧烷组合物压在母体上,II)固化可固化的硅氧烷组合物以形成硅氧烷模具,II)分离母体和硅氧烷模具,IV)填充硅树脂 模具具有带有可固化环氧树脂配方的图案化表面; V)固化可固化环氧树脂制剂以形成图案化特征; VI)分离有机硅模具和图案特征; 任选地VIII)蚀刻图案特征; 可选择IX)清洁硅胶模具; 和任选的X)重复步骤IV)至IX)重复使用硅氧烷模具。