公开(公告)号：WO2013110968A1

公开(公告)日：2013-08-01

申请号：PCT/IB2012/002714

申请日：2012-12-13

Applicant: GIGAPHOTON INC.

Inventor： IGARASHI, Miwa ,  WATANABE, Yukio ,  ASHIKAWA, Kouji ,  IWAI, Norio ,  WAKABAYASHI, Osamu

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G21K5/10 ,  H05G2/003

Abstract: An apparatus for generating extreme ultraviolet light may include a reference member (9), a chamber (2) fixed to the reference member, the chamber including at least one window (38), a laser beam introduction optical system (50) configured to introduce an externally supplied laser beam into the chamber through the at least one window, and a positioning mechanism (10) configured to position the laser beam introduction optical system to the reference member.

Abstract translation: 用于产生极紫外光的装置可以包括参考构件（9），固定到参考构件的腔室（2），所述腔室包括至少一个窗口（38），激光束引入光学系统（50） 外部提供的激光束通过所述至少一个窗口进入所述腔室;以及定位机构（10），其配置成将所述激光束引入光学系统定位到所述参考构件。