公开(公告)号：WO2021195063A1

公开(公告)日：2021-09-30

申请号：PCT/US2021/023649

申请日：2021-03-23

Applicant: ILLUMINA, INC.

Inventor： MERKEL, Timothy J. ,  WANG, Ruibo ,  WRIGHT, Daniel ,  CHAN, Danny Yuan ,  AIYAR, Avishek ,  GHONGE, Tanmay ,  BRAHMA, Neil ,  PITERA, Arthur

IPC: G03F7/00 ,  G03F7/075 ,  B29C59/022 ,  B29K2083/00 ,  B29K2105/0002 ,  C09D183/14 ,  G03F7/0002 ,  G03F7/0755 ,  G03F7/162 ,  G03F7/168

Abstract: An imprinting apparatus includes a silicon master and an anti-stick layer coating the silicon master. The silicon master includes a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features comprises a depression having an opening with its largest opening dimension being less than about 300 nm. The anti-stick layer includes a crosslinked silane polymer network.