公开(公告)号：WO2023278109A1

公开(公告)日：2023-01-05

申请号：PCT/US2022/032614

申请日：2022-06-08

Applicant: INPRIA CORPORATION

Inventor： JILEK, Robert E. ,  CARDINEAU, Brian J. ,  HUIHUI-GIST, Kierra ,  MEYERS, Stephen T.

IPC: C07F7/22 ,  C07F19/00 ,  G03F7/004 ,  G03F7/20 ,  C07F7/2208 ,  C07F7/2224 ,  C07F7/2284 ,  G03F7/162 ,  G03F7/2004 ,  G03F7/325 ,  G03F7/38

Abstract: Organotin compounds are presented that are represented by the formula RSnL3, wherein R is a deuterated hydrocarbyl group and L is a hydrolysable ligand. Two different synthesis techniques are described for synthesizing these compositions. A first method involves reacting a primary halide hydrocarbyl compound (R-X, where X is a halide atom) with an organometallic composition comprising SnL3 moieties associated with metal cations M, where M is an alkali metal, alkaline earth metal, and/or pseudo-alkaline earth metal (Zn, Cd, or Hg), and L is either an amide ligand resulting in an alkali metal tin triamide compound or an acetylide ligand resulting in an alkali metal tin triacetylide, to form correspondingly a monohydrocarbyl tin triamide (RSn(NR'2)3) or a monohydrocarbyl tin triacetylide (RSn(C≡CRs)3). An alternative approach involves reacting a Grignard reagent RMgX with SnL4 in a solution comprising an organic solvent to form a monoorgano tin tralkylamide, a monoorgano tin trialkoxide, monoorgano tin tri acetylide or monoorgano tin tricarboxylate. The compositions are useful for radiation patterning, especially with EUV radiation.

公开(公告)号：WO2022005855A1

公开(公告)日：2022-01-06

申请号：PCT/US2021/038758

申请日：2021-06-23

Applicant: APPLIED MATERIALS, INC.

Inventor： DAI, Yuqiong ,  SACHAN, Madhur ,  FREED, Regina ,  HWANG, Hoyung, David

IPC: G03F7/36 ,  G03F7/004 ,  G03F7/20 ,  C23C16/06 ,  G03F7/0042 ,  G03F7/0043 ,  G03F7/0047 ,  G03F7/162 ,  G03F7/40

Abstract: Embodiments disclosed herein include a method of developing a metal oxo photoresist with a non-wet process. In an embodiment, the method comprises providing a substrate with the metal oxo photoresist into a chamber. In an embodiment, the metal oxo photoresist comprises exposed regions and unexposed regions, and the unexposed regions comprise a higher carbon concentration than the exposed regions. In an embodiment, the method further comprises flowing a gas into the chamber, wherein the gas reacts with the unexposed regions to produce a volatile byproduct.

公开(公告)号：WO2022072274A1

公开(公告)日：2022-04-07

申请号：PCT/US2021/052178

申请日：2021-09-27

Applicant: ILLUMINA, INC.

Inventor： KODIRA CARIAPPA, Brinda ,  FISHER, Jeffrey S. ,  HONG, Sahngki ,  KRAFT, Lewis J. ,  MATHER, Brian D. ,  MONTANO-MACHADO, Vanessa

IPC: B01J19/00 ,  B01L3/00 ,  C12Q1/68 ,  G01N21/05 ,  B01J19/0046 ,  B01J2219/00317 ,  B01J2219/00608 ,  B01J2219/00619 ,  B01J2219/00621 ,  B01J2219/00722 ,  B01L2300/0887 ,  B01L2300/165 ,  B01L3/502707 ,  G01N2021/7763 ,  G03F7/0037 ,  G03F7/0382 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/2016 ,  G03F7/322

Abstract: In one example, a flow cell includes a base support and a protrusion over the base support, where the protrusion is a different material than the base support. The flow cell further includes a first functionalized layer over a first portion of the protrusion, a second functionalized layer over a second portion of the protrusion, and first and second primer sets respectively attached to the first and second functionalized layers.

公开(公告)号：WO2021195063A1

公开(公告)日：2021-09-30

申请号：PCT/US2021/023649

申请日：2021-03-23

Applicant: ILLUMINA, INC.

Inventor： MERKEL, Timothy J. ,  WANG, Ruibo ,  WRIGHT, Daniel ,  CHAN, Danny Yuan ,  AIYAR, Avishek ,  GHONGE, Tanmay ,  BRAHMA, Neil ,  PITERA, Arthur

IPC: G03F7/00 ,  G03F7/075 ,  B29C59/022 ,  B29K2083/00 ,  B29K2105/0002 ,  C09D183/14 ,  G03F7/0002 ,  G03F7/0755 ,  G03F7/162 ,  G03F7/168

Abstract: An imprinting apparatus includes a silicon master and an anti-stick layer coating the silicon master. The silicon master includes a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features comprises a depression having an opening with its largest opening dimension being less than about 300 nm. The anti-stick layer includes a crosslinked silane polymer network.