公开(公告)号：WO2007019118A2

公开(公告)日：2007-02-15

申请号：PCT/US2006/029807

申请日：2006-08-01

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  ZYWNO, Marek ,  MANKOS, Marian ,  HESS, Harald ,  LEVI, Shem-Tov

Inventor： ZYWNO, Marek ,  MANKOS, Marian ,  HESS, Harald ,  LEVI, Shem-Tov

IPC: G01N23/00

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/2817 ,  H01J2237/31766

Abstract: Systems, control subsystems, and methods for projecting an electron beam onto a specimen are provided. One system includes a stage configured to move the specimen with a non-uniform velocity. The system also includes a projection subsystem configured to project the electron beam onto the specimen while the stage is moving the specimen at the non-uniform velocity. In addition, the system includes a control subsystem configured to alter one or more characteristics of the electron beam while the projection subsystem is projecting the electron beam onto the specimen based on the non-uniform velocity. One method includes moving the specimen with a non-uniform velocity and projecting the electron beam onto the specimen during movement of the specimen. In addition, the method includes altering one or more characteristics of the electron beam during projection of the electron beam onto the specimen based on the non-uniform velocity.

Abstract translation: 提供了将电子束投射到试样上的系统，控制子系统和方法。 一个系统包括配置成以不均匀的速度移动样本的台。 该系统还包括一个投影子系统，配置成将电子束投射到样本上，同时舞台以不均匀的速度移动样本。 另外，该系统包括控制子系统，该控制子系统被配置为改变电子束的一个或多个特性，同时投影子系统基于非均匀速度将电子束投影到样本上。 一种方法包括以不均匀的速度移动样品并在样品移动期间将电子束投射到样品上。 另外，该方法包括在基于非均匀速度将电子束投影到样本上时改变电子束的一个或多个特性。

公开(公告)号：WO2003083835A2

公开(公告)日：2003-10-09

申请号：PCT/US2003/009082

申请日：2003-03-22

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： ZHU, Jun ,  MORARU, Alex ,  ZANETTI, Teodor ,  TAO, Franklin ,  KILMER, Dan, L. ,  HESS, Harald ,  CARR, Tom ,  BELLIS, Matt ,  PINTO, Gustavo, A. ,  LEE, Patrick, Rodney

IPC: G11B

CPC classification number: G11B5/59633

Abstract: A system and methods for efficiently performing media writing functions is disclosed. The system and methods include: detecting media movement with respect to a base and heads during reading and writing, and moving the heads in response; using an interferometer, such as a dual beam differential interferometer, to dynamically monitor disk position and address perceived errors; and minimizing repeatable and non repeatable runout error by writing data, such as servo bursts, in multiple revolutions to average adverse runout conditions. The present system has the ability to use an interferometer to enhance media certification and perform on line, in situ monitoring of the media, and includes shrouding, head mounting, disk biasing, and related mechanical aspects beneficial to media writing.

Abstract translation: 公开了一种用于有效执行媒体写入功能的系统和方法。 该系统和方法包括：在读取和写入期间相对于基座和头部检测媒体运动，并且响应地移动头部; 使用诸如双光束差分干涉仪的干涉仪来动态地监测磁盘位置并解决感知到的错误; 并通过以多次旋转将数据（例如伺服脉冲串）写入平均不利的跳动条件来最小化可重复和不可重复的跳动误差。 本系统能够使用干涉仪来增强媒体认证，并在线进行现场监控媒体，并且包括遮蔽，头部安装，磁盘偏置以及有利于媒体写作的相关机械方面。

公开(公告)号：WO2008052080A2

公开(公告)日：2008-05-02

申请号：PCT/US2007/082433

申请日：2007-10-24

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  LORDI, Vincenzo ,  LEVI, Shem-Tov ,  HESS, Harald

Inventor： LORDI, Vincenzo ,  LEVI, Shem-Tov ,  HESS, Harald

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/68 ,  H01J2237/31762 ,  Y10S430/143

Abstract: A method and tool for conducting charged-particle beam direct write lithography is disclosed. A disclosed method involves condensing an initial design file down to a set of profiles and a pattern of relative locations to form a formatted pattern file. The formatted pattern file is adjusted to accommodate desired pattern corrections. Portions of the formatted pattern records are extracted to form data strips that have a plurality of channels with a pattern of profiles and spatial indicators. Data strips are sequentially read to construct a printable pattern of profiles and spatial indicators that specify the locations of the profiles. Additionally, the pattern of profiles are sequentially printed from each data strip onto a substrate to form the desired pattern on the substrate.

Abstract translation: 公开了一种用于进行带电粒子束直写光刻的方法和工具。 所公开的方法包括将初始设计文件缩小到一组简档和相对位置的图案以形成格式化的图案文件。 格式化的图案文件被调整以适应所需的图案校正。 提取格式化图案记录的部分以形成具有多个具有轮廓和空间指示符的图形的通道的数据条。 依次读取数据条以构成可指定轮廓位置的可打印模式和指定轮廓位置的空间指示器。 此外，轮廓的图案从每个数据带顺序地印刷到基底上以在基底上形成期望的图案。

公开(公告)号：WO2003083835A3

公开(公告)日：2003-10-09

申请号：PCT/US2003/009082

申请日：2003-03-22

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： ZHU, Jun ,  MORARU, Alex ,  ZANETTI, Teodor ,  TAO, Franklin ,  KILMER, Dan, L. ,  HESS, Harald ,  CARR, Tom ,  BELLIS, Matt ,  PINTO, Gustavo, A. ,  LEE, Patrick, Rodney

IPC: G11B5/596

Abstract: A system and methods for efficiently performing media writing functions is disclosed. The system and methods include: detecting media movement with respect to a base and heads during reading and writing, and moving the heads in response; using an interferometer, such as a dual beam differential interferometer, to dynamically monitor disk position and address perceived errors; and minimizing repeatable and non repeatable runout error by writing data, such as servo bursts, in multiple revolutions to average adverse runout conditions. The present system has the ability to use an interferometer to enhance media certification and perform on line, in situ monitoring of the media, and includes shrouding, head mounting, disk biasing, and related mechanical aspects beneficial to media writing.