公开(公告)号：WO2022016123A1

公开(公告)日：2022-01-20

申请号：PCT/US2021/042103

申请日：2021-07-16

Applicant: LAM RESEARCH CORPORATION

Inventor： HANSEN, Eric Calvin ,  WEIDMAN, Timothy, William ,  WU, Chenghao ,  LIN, Qinghuang ,  BLAKENEY, Kyle, Jordan

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  H01L21/027 ,  H01L21/67

Abstract: The present disclosure relates to a film formed with a precursor and an organic co-reactant, as well as methods for forming and employing such films. The film can be employed as a photopatternable film or a radiation-sensitive film. In particular embodiments, the carbon content within the film can be tuned by decoupling the sources of the radiation-sensitive metal elements and the radiation-sensitive organic moieties during deposition. In non-limiting embodiments, the radiation can include extreme ultraviolet (EUV) or deep ultraviolet (DUV) radiation.