ELECTROLYTIC GENERATION OF MANGANESE (III) IONS IN STRONG SULFURIC ACID
    1.
    发明申请
    ELECTROLYTIC GENERATION OF MANGANESE (III) IONS IN STRONG SULFURIC ACID 审中-公开
    锰(III)在强硫酸中的电解生成

    公开(公告)号:WO2014164272A1

    公开(公告)日:2014-10-09

    申请号:PCT/US2014/021618

    申请日:2014-03-07

    Abstract: An electrolytic cell and a method of electrochemical oxidation of manganese(II) ions to manganese(III) ions in the electrolytic cell are described. The electrolytic cell comprises (1) an electrolyte solution of manganese(II) ions in a solution of at least one acid; (2) a cathode immersed in the electrolyte solution; and (3) an anode immersed in the electrolyte solution and spaced apart from the cathode. Various anode materials are described including vitreous carbon, reticulated vitreous carbon, woven carbon fibers, lead and lead alloy. Once the electrolyte is oxidized to form a metastable complex of manganese(III) ions, a platable plastic may be contacted with the metastable complex to etch the platable plastic. In addition, a pretreatment step may also be performed on the platable plastic prior to contacting the platable plastic with the metastable complex to condition the plastic surface.

    Abstract translation: 描述了一种电解槽和电解槽中锰(II)离子向锰(III)离子电化学氧化的方法。 电解槽包括(1)在至少一种酸的溶液中的锰(II)离子的电解液; (2)浸入电解液中的阴极; 和(3)浸在电解质溶液中并与阴极间隔开的阳极。 描述了各种阳极材料,包括玻璃碳,网状玻璃碳,编织碳纤维,铅和铅合金。 一旦电解质被氧化形成锰(III)离子的亚稳态络合物,可镀的塑料可与亚稳态络合物接触以蚀刻可镀塑料。 此外,还可以在将可镀塑料与亚稳态复合物接触之前在可镀塑料上进行预处理步骤以调节塑料表面。

    TREATMENT FOR ELECTROPLATING RACKS TO AVOID RACK METALLIZATION
    2.
    发明申请
    TREATMENT FOR ELECTROPLATING RACKS TO AVOID RACK METALLIZATION 审中-公开
    电镀架的处理避免了机架金属化

    公开(公告)号:WO2016022535A1

    公开(公告)日:2016-02-11

    申请号:PCT/US2015/043570

    申请日:2015-08-04

    Abstract: a method of coating an electroplating rack used for supporting non-conductive substrates during a plating process. The method comprises the steps of contacting at least a portion of the electroplating rack with a plastisol composition, the plastisol composition having dispersed therein an effective amount of an additive having the structure: Formula (I) wherein R, R', R" and R'" are either the same or are independently selected from the group consisting of benzyl, substituted benzyl, phenyl or substituted phenyl; or :Formula (II) wherein R, R', R" and R'" are either the same or are independently selected from C I - CI O alkyl (either straight or branched chain), benzyl, substituted benzyl, phenyl, or substituted phenyl and M is a divalent metal cation, preferably selected from the group consisting of nickel, copper and zinc; and heating the electroplating rack with the plastisol composition thereon to a suitable temperature and for a sufficient time to cure the plastisol and form a solid insulating coating on the electroplating rack. The coated electroplating rack may then be used for mounting non- conductive substrates for subsequent metallization steps.

    Abstract translation: 一种在电镀工艺中涂覆用于支撑非导电衬底的电镀架的方法。 该方法包括以下步骤:使电镀架的至少一部分与增塑溶胶组合物接触,增塑溶胶组合物中分散有有效量的具有以下结构的添加剂:式(I)其中R,R',R“和R “”相同或独立地选自苄基,取代的苄基,苯基或取代的苯基; 或者:式(II)其中R,R',R“和R”“相同或独立地选自C 1 -C 10烷基(直链或支链),苄基,取代的苄基,苯基或取代的苯基 M是二价金属阳离子,优选选自镍,铜和锌; 并将其上的增塑溶胶组合物的电镀架加热到合适的温度并持续足够的时间固化增塑溶胶并在电镀架上形成固体绝缘涂层。 然后可以将涂覆的电镀架用于安装非导电衬底以用于随后的金属化步骤。

    TREATMENT OF PLASTIC SURFACES AFTER ETCHING IN NITRIC ACID CONTAINING MEDIA
    3.
    发明申请
    TREATMENT OF PLASTIC SURFACES AFTER ETCHING IN NITRIC ACID CONTAINING MEDIA 审中-公开
    在含有硝酸的介质中蚀刻后的塑料表面处理

    公开(公告)号:WO2013048635A1

    公开(公告)日:2013-04-04

    申请号:PCT/US2012/051136

    申请日:2012-08-16

    CPC classification number: C23C22/73 C23C18/2086 C23C18/24 C23C18/30 C23C18/32

    Abstract: A process for plating metal on plastic substrates, particularly ABS substrates, without the use of chrome containing etchants is disclosed. The process involves (i) etching the plastic substrate in an acidic solution of nitrate ions, and preferably silver ions, (ii) conditioning the substrate in an aqueous solution containing an amine or ammonia, (iii) activating the substrate, preferably with a palladium activator, and (iv) plating the substrate with an electroless plating solution. The process allows for complete adherent electroless plating of plastic substrates, particularly ABS substrates, without the use of chromic etchants.

    Abstract translation: 公开了一种在不使用含铬蚀刻剂的情况下将金属镀在塑料基材,特别是ABS基材上的方法。 该方法包括(i)在硝酸根离子的酸性溶液中蚀刻塑料基底,优选银离子,(ii)在含胺或氨的水溶液中调理底物,(iii)活化底物,优选用钯 活化剂,和(iv)用化学镀溶液电镀基材。 该方法允许塑料基材,特别是ABS基材的完全粘附无电镀,而不使用铬蚀刻剂。

    TREATMENT OF ETCH BATHS
    4.
    发明申请
    TREATMENT OF ETCH BATHS 审中-公开
    治疗脓毒症

    公开(公告)号:WO2017059019A1

    公开(公告)日:2017-04-06

    申请号:PCT/US2016/054350

    申请日:2016-09-29

    CPC classification number: C25D21/18 C23C18/24 C25D5/56

    Abstract: A method of maintaining a concentration of sulfuric acid in an electrolyte comprising manganese(III) ions in a solution of sulfuric acid. The method includes the steps of a) removing a portion of the electrolyte from the electrolytic cell to an annex tank; b) treating the removed portion of the electrolyte in the annex tank to remove moisture from the portion of the electrolyte; and c) returning the treated portion of the electrolyte to the electrolytic cell. The removed portion of the electrolyte is treated by passing a dry gas over the surface of the electrolyte in the annex tank to absorb moisture from the electrolyte and restore the concentration of sulfuric acid in the electrolyte.

    Abstract translation: 在硫酸溶液中将包含锰(III)离子的电解质中的硫酸浓度维持在一起的方法。 该方法包括以下步骤:a)将电解质的一部分从电解槽移除到附加罐; b)处理附件罐中的电解质的去除部分以从电解质的部分去除水分; 以及c)将经处理的电解质部分返回到电解槽。 通过将干燥气体通过附件槽中的电解质的表面进行处理以吸收电解质中的水分,并恢复电解液中硫酸的浓度来处理电解质的去除部分。

    TREATMENT FOR ELECTROPLATING RACKS TO AVOID RACK METALLIZATION
    5.
    发明申请
    TREATMENT FOR ELECTROPLATING RACKS TO AVOID RACK METALLIZATION 审中-公开
    电镀架的处理避免了机架金属化

    公开(公告)号:WO2015126544A1

    公开(公告)日:2015-08-27

    申请号:PCT/US2015/011704

    申请日:2015-01-16

    CPC classification number: C25D17/08 C23C18/163

    Abstract: An electroplating rack for supporting non-conductive substrates during an electrodeposition process is described. The electroplating rack is coated with a non-conductive material, such as a PVC plastisol. The electroplating rack is treated with a non-aqueous solution comprising a metallization inhibitor prior to the electrodeposition process to inhibit rack plate up when using etchants that do not contain chromic acid.

    Abstract translation: 描述了一种用于在电沉积工艺期间支撑非导电衬底的电镀架。 电镀机架涂有非导电材料,如PVC增塑溶胶。 在电沉积过程之前,用包含金属化抑制剂的非水溶液处理电镀架,以在使用不含铬酸的蚀刻剂时抑制齿条板的上升。

    ELECTROLYTIC GENERATION OF MANGANESE (III) IONS IN STRONG SULFURIC ACID
    6.
    发明申请
    ELECTROLYTIC GENERATION OF MANGANESE (III) IONS IN STRONG SULFURIC ACID 审中-公开
    锰(III)在强硫酸中的电解生成

    公开(公告)号:WO2014077957A1

    公开(公告)日:2014-05-22

    申请号:PCT/US2013/061860

    申请日:2013-09-26

    Abstract: An electrolytic cell and a method of electrochemical oxidation of manganese (II) ions to manganese(III) ions in the electrolytic cell are described. The electrolytic cell comprises ( 1 ) an electrolyte solution of manganese(II) ions in a solution of 9 to 15 molar sulfuric acid; (2) a cathode immersed in the electrolyte solution; and (3) an anode immersed in the electrolyte solution and spaced apart from the cathode. Various anode materials are described including vitreous carbon, reticulated vitreous carbon, and woven carbon fibers.

    Abstract translation: 描述了一种电解槽和电解槽中锰(II)离子向锰(III)离子电化学氧化的方法。 电解槽包括(1)在9〜15摩尔硫酸的溶液中的锰(II)离子的电解液; (2)浸入电解液中的阴极; 和(3)浸在电解质溶液中并与阴极间隔开的阳极。 描述了各种阳极材料,包括玻璃碳,网状玻璃碳和编织碳纤维。

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