METHOD AND APPARATUS FOR FABRICATING A THIN-FILM SOLAR CELL UTILIZING A HOT WIRE CHEMICAL VAPOR DEPOSITION TECHNIQUE
    2.
    发明申请
    METHOD AND APPARATUS FOR FABRICATING A THIN-FILM SOLAR CELL UTILIZING A HOT WIRE CHEMICAL VAPOR DEPOSITION TECHNIQUE 审中-公开
    用于制造使用热线化学气相沉积技术的薄膜太阳能电池的方法和装置

    公开(公告)号:WO2003017384A1

    公开(公告)日:2003-02-27

    申请号:PCT/US2001/025659

    申请日:2001-08-16

    Abstract: A thin-film solar cell is provided. The thin-film solar cell comprises an a-SiGe:H (1.6eV) n-i-p solar cell having a deposition rate of at least ten (10) Å/second for the a-SiGe:H intrinsic layer by hot wire chemical vapor deposition. A method for fabricating a thin film solar cell is also provided. The method comprises depositing a n-i-p layer at a deposition rate of at least ten (10) Å/second for the a-SiGe:H intrinsic layer.

    Abstract translation: 提供薄膜太阳能电池。 薄膜太阳能电池包括通过热线化学气相沉积对a-SiGe:H本征层具有至少十(10)ANGSTROM /秒的沉积速率的a-SiGe:H(1.6eV)n-i-p太阳能电池。 还提供了一种制造薄膜太阳能电池的方法。 该方法包括以a-SiGe:H本征层至少十(10)ANGSTROM /秒的沉积速率沉积n-i层。

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