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    ILLUMINATION SYSTEM WITH FLAT 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL
    1.
    发明申请
    ILLUMINATION SYSTEM WITH FLAT 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL 审中-公开

    公开(公告)号：WO2018200536A2

    公开(公告)日：2018-11-01

    申请号：PCT/US2018/029160

    申请日：2018-04-24

    Applicant: NIKON CORPORATION ,  SMITH, Daniel, Gene ,  WILLIAMSON, David, M.

    Inventor： SMITH, Daniel, Gene ,  WILLIAMSON, David, M.

    IPC: G03F7/20 ,  G02B17/06 ,  G21K1/06

    Abstract: A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of only three optical components disposed sequentially to transfer EUV radiation incident the first optical component onto the pattern-source. The combination is disposed in a fixed spatial and optical relationship with respect to the patternsource, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes |includes a projection optic sub-system configured to form an optical image of the patternsource on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

    AUTOFOCUS SYSTEM WITH ERROR COMPENSATION
    2.
    发明申请
    AUTOFOCUS SYSTEM WITH ERROR COMPENSATION 审中-公开
    AUTOFOCUS系统错误补偿

    公开(公告)号：WO2009070492A1

    公开(公告)日：2009-06-04

    申请号：PCT/US2008/084238

    申请日：2008-11-20

    Applicant: NIKON CORPORATION ,  SMITH, Daniel, Gene

    Inventor： SMITH, Daniel, Gene

    IPC: H01L21/30

    CPC classification number: G03F9/7026

    Abstract: An aulofocus system for measuring the position of a work piece along an axis includes a slit light source assembly, a slit detector assembly, and a control system The slit light source assembly directs a first slit of light at a first slit area of the work piece The slit detector assembly detects light reflected off of the first slit area and generates a first slit signal relating to the amount of light reflected off of the first slit area at the slit detector assembly The control system uses the first slit signal from the slit detector assembly, and first reflectance information of the first slit area to determine the position of the work piece along the axis With this design, the autofocus system can compensate for the changes in reflectivity of the work piece As a result thereof, measurements taken with the autofocus system are more accurate and the work piece can be positioned with improved accuracy

    Abstract translation: 用于测量沿着轴的工件位置的自动对焦系统包括狭缝光源组件，狭缝检测器组件和控制系统。狭缝光源组件将工件的第一狭缝区域处的第一狭缝引导 狭缝检测器组件检测从第一狭缝区域反射的光，并且产生与在狭缝检测器组件处的第一狭缝区域反射的光的量相关的第一狭缝信号。控制系统使用来自狭缝检测器组件的第一狭缝信号 以及第一狭缝区域的第一反射率信息，以确定工件沿着轴的位置通过这种设计，自动对焦系统可以补偿工件的反射率的变化作为其结果，使用自动对焦系统 更准确，工件可以提高准确度

    ENHANCEMENTS TO INTEGRATED OPTICAL ASSEMBLY
    4.
    发明申请
    ENHANCEMENTS TO INTEGRATED OPTICAL ASSEMBLY 审中-公开
    一体化光学组件的增强

    公开(公告)号：WO2013093633A2

    公开(公告)日：2013-06-27

    申请号：PCT/IB2012/003023

    申请日：2012-12-23

    Applicant: NIKON CORPORATION

    Inventor： SMITH, Daniel, Gene

    CPC classification number: G01B11/24 ,  G01S7/481 ,  G01S7/4972 ,  G02B5/122 ,  G02B26/10

    Abstract: An integrated optical assembly is provided, with enhancements that are particularly useful when the integrated optical assembly forms part of a laser radar system. The integrated optical assembly produces a reference beam that is related to the optical characteristics of a scanning reflector, or to changes in position or orientation of the scanning reflector relative to a source. Thus, if the scanning reflector orientation were to shift from its intended orientation (due e.g. to thermal expansion) or if characteristics of the scanning reflector (e.g. the index of refraction of the scanning reflector) were to change on account of temperature changes, the reference beam can be used to provide data that can be used to account for such changes. In addition, if the scanning reflector were to be positioned in an orientation other than the orientation desired, the reference beam can be used in identifying and correcting that positioning.

    Abstract translation: 提供了一种集成光学组件，其具有在集成光学组件形成激光雷达系统的一部分时特别有用的增强功能。 集成光学组件产生与扫描反射器的光学特性相关的参考光束，或者相对于光源的扫描反射器的位置或取向的改变。 因此，如果扫描反射器取向从其预期取向（由于例如热膨胀）偏移，或者如果扫描反射器的特性（例如扫描反射器的折射率）由于温度变化而改变，则参考 波束可用于提供可用于解释此类更改的数据。 此外，如果扫描反射器被定位在除了所需取向以外的方向上，则可以使用参考光束来识别和校正该定位。

    FIGOPTICAL OBJECTIVE FOR OPERATION IN EUV SPECTRAL REGION
    8.
    发明申请
    FIGOPTICAL OBJECTIVE FOR OPERATION IN EUV SPECTRAL REGION 审中-公开

    公开(公告)号：WO2018194975A2

    公开(公告)日：2018-10-25

    申请号：PCT/US2018/027785

    申请日：2018-04-16

    Applicant: NIKON CORPORATION ,  SMITH, Daniel, Gene ,  WILLIAMSON, David, M.

    Inventor： SMITH, Daniel, Gene ,  WILLIAMSON, David, M.

    IPC: G03F7/20 ,  G02B17/06 ,  G21K1/06

    Abstract: A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N > 1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.

    EIGHT WAVE CORNER CUBE RETARDER FOR LASER RADAR
    9.
    发明申请
    EIGHT WAVE CORNER CUBE RETARDER FOR LASER RADAR 审中-公开
    用于激光雷达的EIGHT WAVE CORNER CUBE延迟器

    公开(公告)号：WO2015031858A2

    公开(公告)日：2015-03-05

    申请号：PCT/US2014/053585

    申请日：2014-08-29

    Applicant: NIKON CORPORATION

    Inventor： SMITH, Daniel, Gene

    IPC: G01S17/66 ,  G02B5/04

    CPC classification number: G01S7/4812 ,  G01S7/4813 ,  G01S7/4818 ,  G01S7/499 ,  G01S17/08 ,  G01S17/42 ,  G01S17/66 ,  G02B5/04 ,  G02B5/122 ,  G02B5/3083

    Abstract: Laser radar systems include focusing optical systems having a retroreflector such as a corner cube that is translatable with respect to an objective lens. The retroreflector provides a selected retardance to an interrogation optical beam that is directed to a target as well as to a returned portion of the interrogation optical beam that is directed to a detection system. Typically, an input linearly polarized interrogation beam is returned by the retroreflector as a circularly polarized beam that is directed to the target. Returned beam portions from the target are coupled by the retroreflector to a detection system in a linear polarization that is orthogonal to that of the input linearly polarized optical beam. The retroreflector produces state of polarization changes based on retardance associated with total internal reflection from coated or uncoated optical surfaces. Retroreflector surfaces that are not to introduce retardance are coated with suitable zero or low retardance coatings.

    Abstract translation: 激光雷达系统包括具有回射器的聚焦光学系统，例如可相对于物镜平移的角立方体。 后向反射器向询问光束提供选择的延迟，其被引导到目标以及被引导到检测系统的询问光束的返回部分。 通常，输入线性偏振询问光束由回射器作为被引导到目标的圆偏振光束返回。 来自目标的返回光束部分由后向反射器耦合到与输入的线偏振光束的线偏振正交的线性偏振的检测系统。 后向反射器基于与涂覆或未涂覆的光学表面的全内反射相关的延迟产生偏振变化状态。 不引入延迟的回射器表面涂覆有合适的零或低延迟涂层。

    OPTICAL DELAY SYSTEM
    10.
    发明申请
    OPTICAL DELAY SYSTEM 审中-公开

    公开(公告)号：WO2021173123A1

    公开(公告)日：2021-09-02

    申请号：PCT/US2020/019742

    申请日：2020-02-25

    Applicant: NIKON CORPORATION

    Inventor： STAMPER, Brian, Lee ,  SMITH, Daniel, Gene

    IPC: G02B17/08 ,  G02B27/09 ,  G02B27/14 ,  G02B27/48

    Abstract: An optical system includes a first optical system, a second optical system, and a third optical system. The first optical system divides an input beam into a first light and a second light. The second optical system includes a concave reflective surface which reflects the first light. The third optical system directs at least one of the first light reflected from the second optical system and the second light from the first optical system to an output optical path of the third optical system.

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