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公开(公告)号:WO2021079307A1
公开(公告)日:2021-04-29
申请号:PCT/IB2020/059926
申请日:2020-10-22
Applicant: NOVA MEASURING INSTRUMENTS, INC.
Inventor: REED, David. A , NEWCOME, Bruce H. , SCHUELER, Bruno W.
Abstract: The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting targets.