公开(公告)号：WO2015121867A1

公开(公告)日：2015-08-20

申请号：PCT/IL2015/050174

申请日：2015-02-16

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： BARAK, Gilad ,  VERDENE, Tal ,  YACHINI, Michal ,  SHAFIR, Dror ,  MOON, Changman ,  WOLFLING, Shay

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G03F7/70633 ,  G03F7/70683 ,  G06F17/5072

Abstract: A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range.

Abstract translation: 呈现包括覆盖目标的样本。 所述覆盖目标包括至少一对图案化结构，所述对的图案化结构在样品的分别底部和顶层中以它们之间的一定垂直距离h容纳在其中，其中至少一个图案化结构中的图案具有 对于具有预定波长范围的预定光学覆盖测量方案优化的至少一个图案参数。