公开(公告)号：WO2021144634A1

公开(公告)日：2021-07-22

申请号：PCT/IB2020/061066

申请日：2020-11-24

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： SCHLEIFER, Elad ,  OREN, Yonatan ,  SHAYARI, Amir ,  HOLLANDER, Eyal ,  DEICH, Valery ,  YALOV, Shimon ,  BARAK, Gilad

IPC: G01J3/02 ,  G01J3/44 ,  G01N21/27 ,  G01N21/65 ,  G01N2201/06113 ,  G01N2201/0636

Abstract: A method, a system, and a non-transitory computer readable medium for accurate Raman spectroscopy. The method may include executing at least one iteration of the steps of: (i) performing, by an optical measurement system, a calibration process that comprises (a) finding a misalignment between a region of interest defined by a spatial filter, and an impinging beam of radiation that is emitted from an illuminated area of a sample, the impinging beam impinges on the spatial filter; and (b) determining a compensating path of propagation of the impinging beam that compensates the misalignment; and (ii) performing a measurement process, while the optical measurement system is configured to provide the compensating path of propagation of the impinging beam, to provide one or more Raman spectra.

公开(公告)号：WO2021140508A1

公开(公告)日：2021-07-15

申请号：PCT/IL2021/050018

申请日：2021-01-06

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： YACOBY, Ran ,  STURLESI, Boaz

IPC: G01N21/47 ,  G01N21/89 ,  G01N21/95 ,  G06F9/45

Abstract: A system and methods for OCD metrology are provided including receiving multiple first sets of scatterometric data, dividing each set into k sub-vectors, and training, in a self-supervised manner, k2 auto-encoder neural networks that map each of the k sub-vectors to each other. Subsequently multiple respective sets of reference parameters and multiple corresponding second sets of scatterometric data are received and a transfer neural network (NN) is trained. Initial layers include a parallel arrangement of the k2 encoder neural networks. Target output of the transfer NN training is set to the multiple sets of reference parameters and feature input is set to the multiple corresponding second sets of scatterometric data, such that the transfer NN is trained to estimate new wafer pattern parameters from subsequently measured sets of scatterometric data.

公开(公告)号：WO2020105036A1

公开(公告)日：2020-05-28

申请号：PCT/IL2019/051253

申请日：2019-11-17

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： DOTAN, Elad ,  VANHOTSKER, Moshe ,  YALOV, Shimon ,  DEICH, Valery ,  RINGEL, Roi ,  SHULMAN, Beni ,  BAR ON, Yosi ,  BASSAN, Shahar

IPC: G01N21/95 ,  G01N23/04 ,  G01B9/02 ,  G01N21/88

Abstract: A measurement system is presented configured for integration with a processing equipment for applying optical measurements to a structure. The measurement system comprises: a support assembly for holding a structure under measurements in a measurement plane, configured and operable for rotation in a plane parallel to the measurement plane and for movement along a first lateral axis in said measurement plane; an optical system defining illumination and collection light channels of normal and oblique optical schemes and comprising an optical head comprising at least three lens units located in the illumination and collection channels; a holder assembly comprising: a support unit for carrying the optical head, and a guiding unit for guiding a sliding movement of the support unit along a path extending along a second lateral axis perpendicular to said first lateral axis; and an optical window arrangement comprising at least three optical windows made in a faceplate located between the optical head at a certain distance from the measurement plane. The optical windows are aligned with the illumination and collection channels for, respectively, propagation of illuminating light from the optical head and propagation of light returned from an illuminated region to the optical head, in accordance with the normal and oblique optical schemes.

公开(公告)号：WO2016092506A1

公开(公告)日：2016-06-16

申请号：PCT/IB2015/059523

申请日：2015-12-10

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： COHEN, Oded ,  BARAK, Gilad ,  TUROVETS, Igor

IPC: H01L21/66 ,  G03F7/00

CPC classification number: G03F7/70625 ,  G03F7/70466 ,  G03F7/70683 ,  H01L22/30 ,  H01L22/34

Abstract: A test structure and method of its manufacture are presented for use in metrology measurements of a sample pattern. The test structure comprises a test pattern comprising a portion of the sample pattern including at least one selected feature and a blocking layer at least partially covering regions of the test structure adjacent to the at least one selected region

Abstract translation: 提供了一种测试结构及其制造方法，用于样本图形的度量测量。 测试结构包括测试图案，该测试图案包括样本图案的一部分，其包括至少一个所选择的特征，以及至少部分地覆盖与所述至少一个选定区域相邻的测试结构的区域的阻挡层

公开(公告)号：WO2016020925A1

公开(公告)日：2016-02-11

申请号：PCT/IL2015/050807

申请日：2015-08-06

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： BARAK, Gilad ,  COHEN, Oded

IPC: G01B9/00

CPC classification number: G01N21/956 ,  G01B11/14 ,  G01B2210/56 ,  H01L22/30

Abstract: A test structure is presented for use in metrology measurements of a sample pattern. The test structure comprises a main pattern, and one or more auxiliary patterns. The main pattern is formed by a plurality of main features extending along a first longitudinal axis and being spaced from one another along a second lateral axis. The one or more auxiliary patterns are formed by a plurality of auxiliary features associated with at least some of the main features such that a dimension of the auxiliary feature is in a predetermined relation with a dimension of the respective main feature. This provides that a change in a dimension of the auxiliary feature from a nominal value affects a change in non-zero order diffraction response from the test structure in a predetermined optical measurement scheme, and this change is indicative of a deviation in one or more parameters of the main pattern from nominal value thereof.

Abstract translation: 提供测试结构用于样本图案的度量测量。 测试结构包括主图案和一个或多个辅助图案。 主图案由沿着第一纵向轴线延伸并沿着第二横向轴线彼此间隔开的多个主要特征形成。 一个或多个辅助图案由与主要特征中的至少一些相关联的多个辅助特征形成，使得辅助特征的尺寸与相应主要特征的尺寸成预定关系。 这提供了辅助特征从标称值的尺寸的变化影响预定光学测量方案中来自测试结构的非零级衍射响应的变化，并且该变化表示一个或多个参数中的偏差 主要模式的标称值。

公开(公告)号：WO2015193904A1

公开(公告)日：2015-12-23

申请号：PCT/IL2015/050625

申请日：2015-06-18

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： BARAK, Gilad ,  COHEN, Oded ,  TUROVETS, Igor

IPC: G01N21/956 ,  G01N21/47 ,  G01B9/00 ,  G01J3/00

CPC classification number: G01N21/95607 ,  G01B2210/56 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8848 ,  H01L22/30

Abstract: A test structure is presented for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis. The test structure comprises a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some features of the main pattern, parameters of which are to be controlled during metrology measurements.

Abstract translation: 提供测试结构用于由单位单元的周期性形成的样本图案的度量测量，每个单位单元由沿着图案轴线以间隔关系排列的图案特征形成。 测试结构包括测试图案，该测试图案由主图案形成，该主图案包括一个或多个单位单元的主图案特征并具有对称平面，以及预定的辅助图案，其包括位于其内的至少两个间隔开的辅助特征 最少的主要模式的一些特征，其参数在计量测量期间被控制。

公开(公告)号：WO2015125149A1

公开(公告)日：2015-08-27

申请号：PCT/IL2015/050203

申请日：2015-02-23

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： BARAK, Gilad ,  SHAFIR, Dror ,  GROSSMAN, Danny

IPC: G01B11/24 ,  G01B9/02 ,  G01N21/956

CPC classification number: G01J9/00 ,  G01B11/02 ,  G01B2210/56 ,  G01J9/02 ,  G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/12

Abstract: A metrology system is presented for measuring parameters of a structure. The system comprises: an optical system and a control unit. The optical system is configured for detecting light reflection of incident radiation from the structure and generating measured data indicative of angular phase of the detected light components corresponding to reflections of illuminating light components having different angles of incidence. The control unit is configured for receiving and processing the measured data and generating a corresponding phase map indicative of the phase variation along at least two dimensions, and analyzing the phase map using modeled data for determining one or more parameters of the structure.

Abstract translation: 提出了一种用于测量结构参数的计量系统。 该系统包括：光学系统和控制单元。 光学系统被配置用于检测来自结构的入射辐射的光反射，并产生指示与具有不同入射角的照明光分量的反射相对应的检测到的光分量的角相位的测量数据。 控制单元被配置为接收和处理测量数据并且沿着至少两个维度生成指示相位变化的对应相位图，并且使用用于确定结构的一个或多个参数的建模数据来分析相位图。

公开(公告)号：WO2014128710A1

公开(公告)日：2014-08-28

申请号：PCT/IL2014/050189

申请日：2014-02-20

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： BARAK, Gilad ,  SHAFIR, Dror ,  HAINICK, Yanir ,  GOV, Shahar

IPC: G01B9/02 ,  G01B11/30 ,  G01N21/956

CPC classification number: G01N21/956 ,  G01B2210/56 ,  G01N21/9501 ,  G03F7/70625

Abstract: A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

Abstract translation: 提出了一种用于图案化结构的光学测量的方法和系统。 该方法包括对具有测量点的结构执行多个光学测量，所述测量点被配置为提供对从至少部分地覆盖结构的至少两个不同区域的照明点反射的光的检测。 所述测量包括从所述至少两个不同区域的所述至少一部分反射的光的检测，包括从所述至少两个不同区域的所述至少一部分反射的至少两个复电场的干涉，并因此指示相位响应 的结构，携带关于结构的属性的信息。

公开(公告)号：WO2014102792A1

公开(公告)日：2014-07-03

申请号：PCT/IL2013/051075

申请日：2013-12-26

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： SHAFIR, Dror ,  BARAK, Gilad ,  WOLFING, Shay

IPC: G01B9/00 ,  G01B11/25 ,  G02B21/00 ,  G01N21/00 ,  G01J3/42 ,  G01J3/447 ,  G01J4/00 ,  G01J3/45

CPC classification number: G01B11/02 ,  G01B2210/56 ,  G01N21/4738 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/12 ,  G02B21/365

Abstract: Method and system for measuring one or more parameters of a patterned structure, using light source producing an input beam of at least partially coherent light in spatial and temporal domains, a detection system comprising a position sensitive detector for receiving light and generating measured data indicative thereof, an optical system configured for focusing the input light beam onto a diffraction limited spot on a sample's surface, collecting an output light returned from the illuminated spot, and imaging the collected output light onto a light sensitive surface of the position sensitive detector, where an image being indicative of coherent summation of output light portions propagating from the structure in different directions.

Abstract translation: 用于测量图案化结构的一个或多个参数的方法和系统，其使用在空间和时间域中产生至少部分相干光的输入光束的光源，包括用于接收光并产生指示其的测量数据的位置敏感检测器的检测系统 ，配置成将输入光束聚焦到样品表面上的衍射限制光斑上的光学系统，收集从照明光点返回的输出光，并将收集的输出光成像到位置敏感检测器的光敏表面上，其中 图像表示从不同方向从结构传播的输出光部分的相干相加。

公开(公告)号：WO2011117872A1

公开(公告)日：2011-09-29

申请号：PCT/IL2011/000274

申请日：2011-03-24

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  BRILL, Boaz

Inventor： BRILL, Boaz

IPC: G03F7/20 ,  G01B11/00 ,  G01N21/956

CPC classification number: G03F7/70625 ,  G01B2210/56 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822

Abstract: A measurement system and method is presented for measuring properties of a structure having a pattern of spaced-apart features arranged along a pattern axis. The measurement system comprises: a structure support unit defining a support plane for supporting the structure, an optical system comprising an illumination system defining an illumination path, and at least one detection system defining one or more detection paths, and a control system. The optical system has a predetermined numerical aperture, and is configured to define an incidence plane and the detection corresponding to dark-field detection mode for collecting light propagating from an illuminated region on the structure with a solid angle outside that of specular reflection, said incidence plane being oriented with respect to said support plane such as to form a selected angle other than 90 degrees with said pattern axis. The control system is configured and operable for receiving from the detection system data indicative of light detected with said dark-field mode and processing the received data by applying thereto predetermined modeled data based on a predetermined unit cell having a dimension along the patterned axis selected in accordance with the numerical aperture of the optical system.

Abstract translation: 提出了一种用于测量具有沿图案轴线布置的间隔特征图案的结构的性质的测量系统和方法。 测量系统包括：结构支撑单元，其限定用于支撑结构的支撑平面;光学系统，包括限定照明路径的照明系统;以及限定一个或多个检测路径的至少一个检测系统以及控制系统。 光学系统具有预定的数值孔径，并且被配置为限定入射平面和与暗场检测模式相对应的检测，用于收集从结构上的照射区域传播的光，其以镜面反射以外的立体角度，所述入射 平面相对于所述支撑平面定向，以便形成与所述图案轴线不同于90度的选定角度。 控制系统被配置和操作用于从检测系统接收指示用所述暗场模式检测到的光的数据，并且基于具有沿着所选择的图案化轴的尺寸的预定单位单元向其施加预定的建模数据来处理所接收的数据 符合光学系统的数值孔径。