IRREGULAR LARGE VOLUME SEMICONDUCTOR COATINGS FOR QUANTUM DOTS (QDS)
    4.
    发明申请
    IRREGULAR LARGE VOLUME SEMICONDUCTOR COATINGS FOR QUANTUM DOTS (QDS) 审中-公开
    量子点(QDS)的不规则大容量半导体涂层

    公开(公告)号:WO2015109161A1

    公开(公告)日:2015-07-23

    申请号:PCT/US2015/011720

    申请日:2015-01-16

    IPC分类号: H01L33/04

    摘要: Irregular large volume semiconductor coatings for quantum dots (QDs) and the resulting quantum dot materials are described. In an example, a semiconductor structure includes a quantum dot structure having an outermost surface. A crystalline semiconductor coating is disposed on and completely surrounds the outermost surface of the quantum dot structure. The crystalline semiconductor coating has an irregular outermost geometry.

    摘要翻译: 描述了用于量子点(QD)的不规则大体积半导体涂层和所得量子点材料。 在一个示例中,半导体结构包括具有最外表面的量子点结构。 晶体半导体涂层设置在量子点结构的最外表面上并完全包围。 结晶半导体涂层具有不规则的最外几何形状。