公开(公告)号：WO2016037833A1

公开(公告)日：2016-03-17

申请号：PCT/EP2015/069284

申请日：2015-08-21

Applicant: PAUL SCHERRER INSTITUT

Inventor： BOILLAT, Pierre ,  BÜCHI, Felix ,  GUBLER, Lorenz ,  FORNER CUENCA, Antoni ,  PADESTE, Celestino

IPC: H01M8/02 ,  H01M8/04 ,  H01M8/10

CPC classification number: H01M8/0245 ,  H01M8/0232 ,  H01M8/0234 ,  H01M8/0239 ,  H01M8/0243 ,  H01M8/0267 ,  H01M8/04059 ,  H01M8/04119 ,  H01M8/04126 ,  H01M2008/1095 ,  Y02P70/56

Abstract: The present invention discloses a method of manufacturing gas diffusion layers (GDL) with a defined pattern of hydrophobic and hydrophilic regions. The method to produce electrically conductive porous materials with distributed wettability comprises the steps of: a) Coating the external and internal surfaces of a porous base material made of carbon fiber or Titanium with Fluoroethylene-Propylene (FEP) and/or perfluoroalkoxy (PFA) and/or Ethylene-Tetrafluoroethylene (ETFE) or any other hydrophobic polymer; b) Exposing the coated material to irradiation through a blocking mask such that only parts of the coated porous material are exposed; c) Immersing the previously exposed material in a monomer solution and heating to a temperature higher than 45°C, resulting in the graft co-polymerization of monomers on the FEP layer.

Abstract translation: 本发明公开了一种具有规定图案的疏水和亲水区域的气体扩散层（GDL）的制造方法。 制备具有分布润湿性的导电多孔材料的方法包括以下步骤：a）用氟乙烯 - 丙烯（FEP）和/或全氟烷氧基（PFA）和/或全氟烷氧基（PFA）涂覆由碳纤维或钛制成的多孔基材的外表面和内表面， /或乙烯 - 四氟乙烯（ETFE）或任何其他疏水性聚合物; b）通过阻挡掩模将涂覆的材料暴露于照射，使得只有部分涂覆的多孔材料暴露; c）将先前暴露的材料浸入单体溶液中并加热至高于45℃的温度，导致单体在FEP层上的接枝共聚。

公开(公告)号：WO2003069028A1

公开(公告)日：2003-08-21

申请号：PCT/EP2003/001221

申请日：2003-02-07

Applicant: PAUL SCHERRER INSTITUT ,  GOBRECHT, Jens ,  SOLAK, Harun ,  PADESTE, Celestino ,  KAMBACH, Christian

Inventor： GOBRECHT, Jens ,  SOLAK, Harun ,  PADESTE, Celestino ,  KAMBACH, Christian

IPC: C30B7/00

CPC classification number: G03F7/00 ,  C07K1/306 ,  C30B7/00 ,  C30B29/58 ,  Y10S977/888

Abstract: It is the aim of the invention to provide a technology for the stimulation of the crystallization of biomolecules contained in a liquid solution that leads to significant improvements in the reliability of crystall growth processes and shortens the time and the number of attempts to grow a certain biomolecule crystal, also under the condition that only very small amounts of the biomolecules are available. This task is solved according to the invention by a method for generating an artificially patterned substrate for stimulating the crystallation of a biomolecule, comprising: a) treating a basic substrate for providing an artificially patterned substrate (4); i) generating said artificially patterned substrate by exposing x-ray-radiation to said basic substrate; ii) performing said exposing of the x-ray-radiation (2) according to X-ray interference lithography technology; With respect to a method for stimulating the crystallization of biomolecules from a liquid solution (20) containing said biomolecules (16, 18), this task is solved according to the invention by a method comprising: a) treating a basic substrate for providing an artificially patterned substrate; i) generating said artificially patterned substrate by exposing x-ray-radiation to said basic substrate; ii) performing said exposing of the X-ray-radiation according to X-ray interference lithography technology; b) bringing said artificially patterned substrate into contact with said solution for initiating the crystallization of said biomolecules on the pattern of the artificially patterned substrate.

Abstract translation: 本发明的目的是提供一种用于刺激液体溶液中包含的生物分子的结晶的技术，其导致结晶生长过程的可靠性的显着改善，并缩短了生长某些生物分子的时间和次数 晶体，也是在只有非常少量的生物分子可用的条件下。 根据本发明，通过用于产生用于刺激生物分子的结晶的人造图案化衬底的方法来解决该任务，该方法包括：处理碱性衬底以提供通过暴露X射线产生所述人造图案化衬底的人造图案化衬底4 对于根据X射线干涉光刻技术对x射线辐射2进行所述曝光的所述基底衬底ii的辐射对于从含有所述生物分子16,18的液体溶液20刺激生物分子的结晶的方法，该方法 根据本发明的任务通过一种方法解决，该方法包括：处理碱性基底，用于提供人造图案化的衬底，i通过将X射线辐射暴露于所述碱性衬底ii进行所述X射线衍射的曝光， 辐射根据X射线干涉光刻技术b带来人为的图案 将所述底物与所述溶液接触，以在所述人造图案化衬底的图案上引发所述生物分子的结晶。

公开(公告)号：WO2005014702A1

公开(公告)日：2005-02-17

申请号：PCT/EP2004/006362

申请日：2004-06-12

Applicant: PAUL SCHERRER INSTITUT ,  BRACK, Hans-Peter ,  PADESTE, Celestino ,  SLASKI, Michal ,  SOLAK, Harun

Inventor： BRACK, Hans-Peter ,  PADESTE, Celestino ,  SLASKI, Michal ,  SOLAK, Harun

IPC: C08J7/18

CPC classification number: C08J7/18 ,  Y10T428/24355 ,  Y10T428/3154 ,  Y10T428/31544 ,  Y10T428/31855 ,  Y10T428/31935 ,  Y10T428/31938

Abstract: According to the present invention a method for grafting a chemical compound to a predetermined region of a support substrate (4) is disclosed, comprising: a) irradiating selectively the support substrate with electromagnetic radiation and/or particle radiation in order to both define said predetermined region and to form at least one reactive functional group or a precursor thereof in said predetermined region of the support substrate; b) exposing the irradiated support substrate to said chemical compound or to a precursor thereof. Therefore, only these very few steps are needed to effectively grafting the desired chemical compound, such as an organic compound, to the predetermined regions of the support substrate. Moreover, the irradiation step can be carried out in a vastly flexible manner and allows to generate numerous distinct shapes of the predetermined regions. Further, micro- or nano-scale regions in the support substrate capable of forming reactive functional groups or precursors thereof upon exposure to particle or electromagnetic irradiation can be easily achieved.

Abstract translation: 根据本发明，公开了一种用于将化学化合物接枝到支撑衬底（4）的预定区域的方法，包括：a）用电磁辐射和/或粒子辐射选择性地照射支撑衬底，以便将所述预定的 并且在所述支撑衬底的所述预定区域中形成至少一个反应性官能团或其前体; b）将照射的支撑基底暴露于所述化合物或其前体。 因此，为了有效地将期望的化合物（例如有机化合物）接枝到支撑基底的预定区域，仅需要这几个步骤。 此外，照射步骤可以以非常灵活的方式进行，并且允许产生许多不同形状的预定区域。 此外，可以容易地实现能够在暴露于粒子或电磁辐射时能够形成反应性官能团或其前体的支持基底中的微尺度或纳米级区域。