公开(公告)号：WO2014151920A3

公开(公告)日：2015-03-12

申请号：PCT/US2014026678

申请日：2014-03-13

Applicant: PIXTRONIX INC

Inventor： ANDO NAOHISA ,  KAWANAGO HIROSHI ,  TAKAHASHI KOHEI

IPC: G02B26/02 ,  G02B26/08

CPC classification number: G02B26/02 ,  B81B3/0008 ,  G02B26/08 ,  G02B26/0841

Abstract: The objective is to cause a substrate on which a shutter is provided and a substrate that opposes it to be electrically continuous. [Means of Solution] On a first substrate 10, a shutter 28 that controls the passing or blocking of light, a driver 52 for driving the shutter 28, and a protruding part 62 having a plurality of side faces 66 rising from the first substrate 10 so as to circumscribe a prescribed space are respectively provided so as to contain a laminate structure of a first conducting film 54 and an insulating film 16. The outermost layer of the respective plurality of side faces 66 is made of the insulating film 16 that covers the first conducting film 54, and has an aperture 68 which exposes part of the first conducting film 54. Conducting particles 70 are arranged in the prescribed space circumscribed by the plurality of side faces 66, and on the side nearest the first substrate 10, contact the first conducting film 54 exposed from the aperture 68 in the plurality of side faces 66, and on the side nearest the second substrate 12, contact a second conducting film 22.

Abstract translation: 目的是使其上设置有快门的基板和与其相反的基板电连续。 解决方案在第一基板10上，控制光的通过或遮挡的挡板28，用于驱动挡板​​28的驱动器52以及具有从第一基板10上升的多个侧面66的突出部62 分别设置规定的空间以包含第一导电膜54和绝缘膜16的层压结构。多个侧面66的最外层由绝缘膜16构成，绝缘膜16覆盖 第一导电膜54，并且具有暴露第一导电膜54的一部分的孔68.导电粒子70布置在由多个侧面66限定的规定空间中，并且在最接近第一基板10的一侧接触 从多个侧面66中的孔68暴露的第一导电膜54和最靠近第二基板12的一侧接触第二导电膜22。