MEMSデバイス
    1.
    发明申请
    MEMSデバイス 审中-公开
    MEMS器件

    公开(公告)号:WO2014122910A1

    公开(公告)日:2014-08-14

    申请号:PCT/JP2014/000547

    申请日:2014-02-03

    Abstract:  MEMSデバイスは、可動部と、フレームと、ビームと、電極基板とを備えている。フレームは可動部の周囲を囲んでいる。ビームは、フレームの少なくとも一部から延伸され、可動部に接続されている。電極基板は、固定電極と、拡張電極と、基板部とを有している。固定電極は、電極基板の、揺動部と対向する領域の少なくとも一部に形成されている。拡張電極は、固定電極と接続されており、かつ電極基板の、軸部と対向する領域の少なくとも一部に形成されている。

    Abstract translation: MEMS器件包括可移动部分,框架,光束和电极基板。 框架围绕可移动部分的周边。 梁从框架的至少一部分延伸并连接到可移动部分。 电极基板具有固定电极,延伸电极和基板。 固定电极形成在面向振荡单元的电极基板上的区域的至少一部分中。 延伸电极连接到固定电极,并且形成在面向轴的电极基板上的区域的至少一部分中。

    静電アクチュエーター、可変容量コンデンサーおよび電気スイッチ
    2.
    发明申请
    静電アクチュエーター、可変容量コンデンサーおよび電気スイッチ 审中-公开
    静电执行器,变压器和电动开关

    公开(公告)号:WO2013076755A1

    公开(公告)日:2013-05-30

    申请号:PCT/JP2011/006483

    申请日:2011-11-22

    Inventor: 埴原 甲二

    CPC classification number: B81B3/0008 B81B2201/0221 H01G5/16

    Abstract:  簡単な構成で、スティクションを防止することができる。 下部駆動電極21および上部駆動電極22にそれぞれ配設されると共に、空隙を介して相互に対面し、静電吸引力を生じさせる一対の低抵抗層21a、22aと、下部駆動電極21および上部駆動電極22に配設され、近接時に相互に接触して、下部駆動電極21および上部駆動電極22上に一対の低抵抗層21a、22aを介した電荷の導通路Aを形成する一対の接触部と、上部駆動電極22に配設されると共に、導通路Aに介設され、所定の駆動電圧を印加したときに一対の低抵抗層21a、22aに静電吸引力を付与するための電位差を生じさせる高抵抗層22aと、を備えた。

    Abstract translation: 在本发明中可以使用简单的结构来防止静电。 提供:一对低电阻层(21a,22a),用于产生分别设置在下驱动电极(21)和上驱动电极(22)上的静电吸引力,并且设置成相对于间隙 ; 一对接触部,用于当通过下驱动电极(21)和上驱动电极(22)上的一对低电阻层(21a,22a)形成用于充电的通电路径(A)时, ),分别设置在下驱动电极(21)和上驱动电极(22)上的一对接触部分。 以及用于产生设置在所述上​​驱动电极(22)上并沿着连接路径(A)设置的电位差的高电阻层(22a),所述高电阻层适于对所述一对低电阻施加静电引力 当施加指定的驱动电压时,层(21a,22a)。

    ELIMINATION OF SILICON RESIDUES FROM MEMS CAVITY FLOOR
    3.
    发明申请
    ELIMINATION OF SILICON RESIDUES FROM MEMS CAVITY FLOOR 审中-公开
    从MEMS CAVITY地板消除硅残余物

    公开(公告)号:WO2013020039A2

    公开(公告)日:2013-02-07

    申请号:PCT/US2012/049497

    申请日:2012-08-03

    Abstract: The present invention generally relates to a MEMS device in which silicon residues from the adhesion promoter material are reduced or even eliminated from the cavity floor. The adhesion promoter is typically used to adhere sacrificial material to material above the substrate. The adhesion promoter is the removed along with then sacrificial material. However, the adhesion promoter leaves silicon based residues within the cavity upon removal. The inventors have discovered that the adhesion promoter can be removed from the cavity area prior to depositing the sacrificial material. The adhesion promoter which remains over the remainder of the substrate is sufficient to adhere the sacrificial material to the substrate without fear of the sacrificial material delaminating. Because no adhesion promoter is used in the cavity area of the device, no silicon residues will be present within the cavity after the switching element of the MEMS device is freed.

    Abstract translation: 本发明一般涉及一种MEMS器件,其中来自粘合促进剂材料的硅残余物从空腔底板减少甚至消除。 粘合促进剂通常用于将牺牲材料粘附到衬底上方的材料上。 粘附促进剂与牺牲材料一起被去除。 然而,粘合促进剂在除去后将空穴中的硅基残留物留下。 发明人已经发现,在沉积牺牲材料之前,可以从空腔区域去除粘合促进剂。 保留在基材的其余部分上的粘合促进剂足以将牺牲材料粘附到基材上,而不用担心牺牲材料分层。 因为在器件的空腔区域中没有使用粘合促进剂,所以在MEMS器件的开关元件被释放之后,腔内将不存在硅残余物。

    DISPLAY DEVICE WITH AT LEAST ONE MOVABLE STOP ELEMENT
    4.
    发明申请
    DISPLAY DEVICE WITH AT LEAST ONE MOVABLE STOP ELEMENT 审中-公开
    具有至少一个可动止动元件的显示装置

    公开(公告)号:WO2011034972A3

    公开(公告)日:2011-05-12

    申请号:PCT/US2010048997

    申请日:2010-09-15

    Abstract: In certain embodiments, a device is provided including a substrate (102) and a plurality of supports (104) over the substrate. The device further includes a mechanical layer (106) having a movable portion and a stationary portion. The stationary portion being disposed over the supports. The device further includes a reflective surface (108) positioned over the substrate and mechanically coupled to the movable portion (112). The device of certain embodiments further includes at least one movable stop element (110) displaced from and mechanically coupled to the movable portion. In certain embodiments, the at least a portion of the stop element may be positioned over the stationary portion.

    Abstract translation: 在某些实施例中,提供了一种装置,其包括衬底(102)和在衬底上的多个支撑件(104)。 该装置还包括具有可移动部分和固定部分的机械层(106)。 固定部分设置在支撑件上。 该装置还包括位于衬底上并机械地联接到可动部分(112)的反射表面(108)。 某些实施例的装置还包括从可移动部分移位并机械联接到可移动部分的至少一个可移动止动元件(110)。 在某些实施例中,止动元件的至少一部分可以定位在固定部分上方。

    NON-PLANAR SURFACE STRUCTURES AND PROCESS FOR MICROELECTROMECHANICAL SYSTEMS
    6.
    发明申请
    NON-PLANAR SURFACE STRUCTURES AND PROCESS FOR MICROELECTROMECHANICAL SYSTEMS 审中-公开
    非平面表面结构和微电子系统的工艺

    公开(公告)号:WO2007123820A3

    公开(公告)日:2008-01-03

    申请号:PCT/US2007008564

    申请日:2007-04-05

    CPC classification number: B81B3/0008 G02B26/001

    Abstract: Methods of making MEMS devices including interferometric modulators involve depositing various layers, including stationary layers, movable layers and sacrificial layers, on a substrate. A non-planar surface is formed on one or more layers by flowing an etchant through a permeable layer. In one embodiment the non-planar surface is formed on a sacrificial layer. A movable layer formed over the non-planar surface of the sacrificial layer results in a non-planar interface between the sacrificial and movable layers. Removal of the sacrificial layer results in a released MEMS device having reduced contact area between the movable and stationary layers when the MEMS device is actuated. The reduced contact area results in lower adhesion forces and reduced stiction during actuation of the MEMS device. These methods may be used to manufacture released and unreleased interferometric modulators.

    Abstract translation: 制造包括干涉式调制器的MEMS器件的方法包括在衬底上沉积包括固定层,可移动层和牺牲层的各种层。 通过使蚀刻剂流过可渗透层而在一个或多个层上形成非平面表面。 在一个实施例中,非平面表面形成在牺牲层上。 形成在牺牲层的非平面表面上的可移动层导致牺牲层和可移动层之间的非平面界面。 牺牲层的去除导致释放的MEMS器件在MEMS器件致动时具有减小可移动层和固定层之间的接触面积。 减小的接触面积导致MEMS器件的致动期间较低的粘附力和降低的静摩擦力。 这些方法可用于制造释放和未释放的干涉式调制器。

    ELECTRONIC DEVICE INCLUDING MULTIPLE CAPACITANCE VALUE MEMS CAPACITOR AND ASSOCIATED METHODS
    7.
    发明申请
    ELECTRONIC DEVICE INCLUDING MULTIPLE CAPACITANCE VALUE MEMS CAPACITOR AND ASSOCIATED METHODS 审中-公开
    包括多电容值MEMS电容器和相关方法的电子器件

    公开(公告)号:WO0243089A9

    公开(公告)日:2004-04-01

    申请号:PCT/US0144472

    申请日:2001-11-27

    Applicant: HARRIS CORP

    CPC classification number: H01G5/16 B81B3/0008

    Abstract: An electronic device, such as a filter of phase shifter, for example, includes a substrate, and a MEMS capacitor on the substrate and having a plurality of selectable capacitance values. The MEMS capacitor includes a lower capacitor electrode on the substrate, and a movable bridge comprising end portions connected to the substrate laterally adjacent the lower capacitor electrode. The movable bridge may also include a conductive medial portion between the end portions defining an upper capacitor electrode suspended above the lower capacitor electrode and being movable between an upper position and a lower position by an electrostatic force generated between the capacitor electrodes. Moreover, the movable bridge may further include at least one trovel limiting portion between the end portions for engaging adjacent sustrate portions to keep the upper capacitor electrode in a predetermined spaced relation from the lower capacitor electrode when in the lower position.

    Abstract translation: 例如移相器的滤波器等电子器件包括衬底和位于衬底上的具有多个可选电容值的MEMS电容器。 所述MEMS电容器包括在所述衬底上的下电容器电极以及包括端部部分的可移动桥,所述端部部分横向地邻近所述下电容器电极连接到所述衬底。 可移动桥还可以包括在端部之间的导电中间部分,所述导电中间部分限定悬置在下电容器电极上方的上电容器电极,并且可以通过在电容器电极之间产生的静电力在上位置与下位置之间移动。 此外,可移动桥还可以包括位于端部之间的至少一个限位部分,用于接合相邻的支撑部分,以在上部电容器电极处于下部位置时保持上部电容器电极与下部电容器电极处于预定间隔关系。

    ELECTRONIC DEVICE INCLUDING MULTIPLE CAPACITANCE VALUE MEMS CAPACITOR AND ASSOCIATED METHODS
    8.
    发明申请
    ELECTRONIC DEVICE INCLUDING MULTIPLE CAPACITANCE VALUE MEMS CAPACITOR AND ASSOCIATED METHODS 审中-公开
    包括多个电容值的电子设备MEMS电容器及相关方法

    公开(公告)号:WO0243089A3

    公开(公告)日:2004-02-26

    申请号:PCT/US0144472

    申请日:2001-11-27

    Applicant: HARRIS CORP

    CPC classification number: H01G5/16 B81B3/0008

    Abstract: An electronic device, such as a filter of phase shifter, for example, includes a substrate, and a MEMS capacitor on the substrate and having a plurality of selectable capacitance values. The MEMS capacitor includes a lower capacitor electrode on the substrate, and a movable bridge comprising end portions connected to the substrate laterally adjacent the lower capacitor electrode. The movable bridge may also include a conductive medial portion between the end portions defining an upper capacitor electrode suspended above the lower capacitor electrode and being movable between an upper position and a lower position by an electrostatic force generated between the capacitor electrodes. Moreover, the movable bridge may further include at least one trovel limiting portion between the end portions for engaging adjacent sustrate portions to keep the upper capacitor electrode in a predetermined spaced relation from the lower capacitor electrode when in the lower position.

    Abstract translation: 例如,诸如移相器的滤波器的电子器件包括衬底和衬底上的MEMS电容器,并且具有多个可选择的电容值。 MEMS电容器包括在基板上的下电容器电极,以及可移动桥,该可移动桥包括与下电容器电极横向相邻地连接到基板的端部。 可移动桥还可以包括在端部之间的导电中间部分,其限定悬挂在下电容器电极上方的上电容器电极,并且可以通过在电容器电极之间产生的静电力在上位置和下​​位置之间移动。 此外,可移动桥可以进一步包括在端部之间的至少一个限位部分,用于接合相邻的底部部分,以在较低位置时将上电容器电极与下电容器电极保持预定间隔的关系。

    MICROMECHANICAL COMPONENTS WITH REDUCED STATIC FRICTION
    9.
    发明申请
    MICROMECHANICAL COMPONENTS WITH REDUCED STATIC FRICTION 审中-公开
    ADHÄSIONSVERMINDERTE微机械部件

    公开(公告)号:WO03031319A3

    公开(公告)日:2003-10-09

    申请号:PCT/DE0203317

    申请日:2002-09-06

    CPC classification number: B81B3/0008 B81C2201/016

    Abstract: The invention concerns micromechanical components (4'; 40) with reduced static friction having in general a size less than 1 mm, devices comprising said components, the manufacture and use of said components, as well as a method for treating the surfaces of micromechanical components (4'; 40). Said method consists in modifying by a surface treatment faulty electronic regions of the semiconductor material used. The inventive components are used for example in acceleration sensors.

    Abstract translation: 有adhäsionsverminderte微机械部件(4“; 40)的尺寸通常小于1的Mn,容纳装置,制备和使用这些组件的以及用于治疗微机械装置的表面的方法这样的装置(4”; 40) 提供,其中该方法包括所使用的半导体材料的电子杂质可以通过表面处理来改变的步骤。 这种装置的使用,例如,在加速度传感器。

    DISPLAY DEVICE AND METHOD FOR PRODUCING SAME
    10.
    发明申请
    DISPLAY DEVICE AND METHOD FOR PRODUCING SAME 审中-公开
    显示装置及其制造方法

    公开(公告)号:WO2014151920A2

    公开(公告)日:2014-09-25

    申请号:PCT/US2014/026678

    申请日:2014-03-13

    CPC classification number: G02B26/02 B81B3/0008 G02B26/08 G02B26/0841

    Abstract: [Problem] The objective is to cause a substrate on which a shutter is provided and a substrate that opposes it to be electrically continuous. [Means of Solution] On a first substrate 10, a shutter 28 that controls the passing or blocking of light, a driver 52 for driving the shutter 28, and a protruding part 62 having a plurality of side faces 66 rising from the first substrate 10 so as to circumscribe a prescribed space are respectively provided so as to contain a laminate structure of a first conducting film 54 and an insulating film 16. The outermost layer of the respective plurality of side faces 66 is made of the insulating film 16 that covers the first conducting film 54, and has an aperture 68 which exposes part of the first conducting film 54. Conducting particles 70 are arranged in the prescribed space circumscribed by the plurality of side faces 66, and on the side nearest the first substrate 10, contact the first conducting film 54 exposed from the aperture 68 in the plurality of side faces 66, and on the side nearest the second substrate 12, contact a second conducting film 22.

    Abstract translation: [问题]目的是使其上提供快门的基板和与其相反的基板电连续。 解决方案在第一基板10上,控制光的通过或遮挡的挡板28,用于驱动挡板​​28的驱动器52以及具有从第一基板10上升的多个侧面66的突出部62 分别设置规定的空间以包含第一导电膜54和绝缘膜16的层压结构。多个侧面66的最外层由绝缘膜16构成,绝缘膜16覆盖 第一导电膜54,并且具有暴露第一导电膜54的一部分的孔68.导电粒子70布置在由多个侧面66限定的规定空间中,并且在最接近第一基板10的一侧接触 从多个侧面66中的孔68暴露的第一导电膜54和最靠近第二基板12的一侧接触第二导电膜22。

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