公开(公告)号：WO2005057992A3

公开(公告)日：2006-02-09

申请号：PCT/FR2004003120

申请日：2004-12-03

Applicant: RASAR HOLDING N V ,  DREAN HENRI-LOUIS

Inventor： DREAN HENRI-LOUIS

IPC: F01N3/08 ,  H05H1/24

CPC classification number: F01N3/0892 ,  F01N2240/28 ,  H05H1/46 ,  H05H2001/4645 ,  H05H2245/1215

Abstract: The invention relates to a device for plasma processing a gaseous medium comprising a processing chamber (2) provided with an envelop (6) having a tapered internal surface (8) which tapers down away from the top end (9) towards the lower end (10) of the processing chamber (2) in which a tapered central rod (11) longitudinally extends and at least four radial partitions (15) forming at least four resonance cavities which have an electric contact (17) with the internal surface (8) of the first chamber (2) and support a perforated cylinder (19) coaxially disposed in the first chamber (2) around the central rod (11) and in which a first electrical phase (59) supplies a high tension alternate current for feeding the envelop (6) of the first processing chamber (2). A method for using said device and the use thereof, in particular for processing exhaust gases of a motor vehicle are also disclosed.

Abstract translation: 本发明涉及一种用于等离子体处理气体介质的装置，包括设置有具有锥形内表面（8）的处理室（2），其具有从顶端（9）朝下端逐渐变细的锥形内表面（8） 其中锥形中心杆（11）纵向延伸的处理室（2）中的至少四个径向隔板（15），形成至少四个共振空腔，其具有与内表面（8）的电接触（17） 并且支撑围绕所述中心杆（11）同轴地设置在所述第一腔室（2）中的多孔圆柱体（19），并且其中第一电相（59）提供高压交流电流以供给所述第一室 第一处理室（2）的封套（6）。 还公开了使用所述装置及其用途的方法，特别是用于处理机动车辆的废气的方法。