公开(公告)号：WO2015175564A1

公开(公告)日：2015-11-19

申请号：PCT/US2015/030422

申请日：2015-05-12

Applicant: RASIRC, INC.

Inventor： ALVAREZ, Daniel, Jr. ,  SPIEGELMAN, Jeffrey, J. ,  HOLMES, Russell, J. ,  HEINLEIN, Edward ,  SHAMSI, Zohreh ,  RAMOS, Christopher ,  DEPTALA, Alexander ,  HOGAN, James

IPC: A61L2/20

CPC classification number: C12Q1/6848 ,  A61L2/186 ,  A61L2/208 ,  A61L2202/24 ,  C12Q1/6806 ,  C12Q2527/125

Abstract: Methods and delivery systems for providing a gas phase of a multi-component liquid source for delivery to a critical process application are provided. The methods include concentration of a component of the liquid source which is less volatile than water for delivery of a gas stream comprising the less volatile component to a critical process application. Critical process applications include decontamination and microelectronic processing applications.

Abstract translation: 提供了用于提供用于递送至关键过程应用的多组分液体源的气相的方法和递送系统。 这些方法包括液体源的组分的浓度，其比水挥发性低，用于将包含较不易挥发组分的气流输送到关键的过程应用中。 关键过程应用包括去污和微电子处理应用。

公开(公告)号：WO2014165637A2

公开(公告)日：2014-10-09

申请号：PCT/US2014/032748

申请日：2014-04-03

Applicant: RASIRC, INC.

Inventor： SPIEGELMAN, Jeffrey, J. ,  HOLMES, Russell, J. ,  ARYA, Bhuvnesh ,  HEINLEIN, Edward ,  ALVAREZ, Daniel, Jr.

IPC: A61L9/02

CPC classification number: B01D53/228 ,  A61L2/00 ,  A61L9/00 ,  F22B1/284 ,  H05B3/009

Abstract: A method and chemical delivery system are provided. The method includes providing a concentrated aqueous hydrogen peroxide solution in a boiler having a head space, boiling the concentrated aqueous hydrogen peroxide solution to produce a dilute vapor comprising hydrogen peroxide within the head space of the boiler, and adding a dilute aqueous hydrogen peroxide solution to the concentrated aqueous hydrogen peroxide solution within the boiler to maintain the concentration of the aqueous hydrogen peroxide solution in the boiler. The method further includes delivering the dilute vapor comprising hydrogen peroxide to a critical process or application. The chemical delivery system includes a concentrated aqueous hydrogen peroxide solution, a boiler having a head space configured for boiling the concentrated aqueous hydrogen peroxide solution and producing a dilute vapor comprising hydrogen peroxide within the head space, and a manifold configured for adding a dilute aqueous hydrogen peroxide solution to the concentrated aqueous hydrogen peroxide solution within the boiler to maintain the concentration of the aqueous hydrogen peroxide solution in the boiler, wherein the manifold is further configured to deliver the dilute vapor comprising hydrogen peroxide to a critical process or application.

Abstract translation: 提供了一种方法和化学物质输送系统。 该方法包括在具有顶部空间的锅炉中提供浓缩的过氧化氢水溶液，煮沸浓缩的过氧化氢水溶液以在锅炉的顶部空间内产生包含过氧化氢的稀释蒸气，并将稀二水过氧化氢溶液 锅炉内浓缩的过氧化氢水溶液，保持锅炉中过氧化氢水溶液的浓度。 该方法还包括将包含过氧化氢的稀释蒸气输送至关键过程或应用。 化学递送系统包括浓缩的过氧化氢水溶液，具有顶部空间的锅炉，所述顶部空间被配置为沸腾浓缩的过氧化氢水溶液，并且在顶部空间内产生包含过氧化氢的稀释蒸气，以及歧管，其构造成用于加入稀氢氧化水溶液 过氧化物溶液加入到锅炉内的浓缩的过氧化氢水溶液中以维持锅炉中过氧化氢水溶液的浓度，其中歧管进一步构造成将包含过氧化氢的稀释蒸气输送至关键的过程或应用。

公开(公告)号：WO2017027581A1

公开(公告)日：2017-02-16

申请号：PCT/US2016/046334

申请日：2016-08-10

Applicant: RASIRC, INC.

Inventor： SPIEGELMAN, Jeffrey ,  SHEPHERD, Douglas ,  HOLMES, Russell, J. ,  SHAMSI, Zohreh

IPC: C23C16/448

CPC classification number: C23C16/4481

Abstract: Methods for the gas-phase delivery of gases, such as process gases, from the gas phase of a multicomponent source liquid are provided. The methods are generally directed to the generation of process gases having mass flow rates which are proportional to the input power delivered to the multicomponent source liquid containers. The methods may be used to deliver process gases to critical process applications.

Abstract translation: 提供了从多组分源液体的气相中气相递送气相（例如工艺气体）的方法。 该方法通常涉及产生具有与输送到多组分源液体容器的输入功率成比例的质量流量的工艺气体。 这些方法可用于将工艺气体输送到关键过程应用中。

公开(公告)号：WO2016065132A1

公开(公告)日：2016-04-28

申请号：PCT/US2015/056887

申请日：2015-10-22

Applicant: RASIRC, INC.

Inventor： ALVAREZ, Daniel, Jr. ,  HOLMES, Russell, J. ,  SPIEGELMAN, Jeffrey ,  HEINLEIN, Edward ,  RAMOS, Christopher

IPC: B01D53/44 ,  B01D53/77 ,  B01J20/292 ,  H01G4/06

CPC classification number: C01B21/16 ,  B01D19/0031 ,  B01D19/0068 ,  B01D63/06 ,  B01D2325/42

Abstract: A method and chemical delivery system and device are provided. One method includes contacting a non-aqueous hydrazine solution with a carrier gas and/or vacuum and delivering a gas stream comprising hydrazine to a critical process or application. One chemical delivery system and device includes a non-aqueous hydrazine solution having a vapor phase that is in contact with a carrier gas and/or vacuum. One device includes a chamber for containing a liquid comprising at least one volatile process chemical, such as a non-aqueous hydrazine solution, a hydrogen peroxide solution, or another suitable process chemical, and a head space from which the volatile can be drawn using a carrier gas and/or vacuum. Another method useful in the present invention involves drawing a process chemical from a device as a disclosed herein using a carrier or vacuum and delivering the process chemical to a critical process or application.

Abstract translation: 提供了一种方法和化学品输送系统和装置。 一种方法包括使非水肼溶液与载气和/或真空接触，并将包含肼的气流输送至关键过程或应用。 一种化学输送系统和装置包括具有与载气和/或真空接触的气相的非水肼溶液。 一个装置包括用于容纳包含至少一种挥发性过程化学品的液体的室，例如非水肼溶液，过氧化氢溶液或其它合适的过程化学品，以及可以使用 载气和/或真空。 在本发明中有用的另一种方法包括从本文公开的装置中使用载体或真空抽出工艺化学品，并将该工艺化学品递送至关键的工艺或应用。

公开(公告)号：WO2012024131A3

公开(公告)日：2012-02-23

申请号：PCT/US2011/047299

申请日：2011-08-10

Applicant: RASIRC, INC. ,  ASML NETHERLANDS B. V. ,  SPIEGELMAN, Jeffrey, J. ,  HOLMES, Russell, J. ,  ALVAREZ, Daniel ,  SCACCABAROZZI, Luigi ,  DONDERS, Sjoerd, Nicolaas Lambertus ,  CASTELIJNS, Henricus, Jozef

Inventor： SPIEGELMAN, Jeffrey, J. ,  HOLMES, Russell, J. ,  ALVAREZ, Daniel ,  SCACCABAROZZI, Luigi ,  DONDERS, Sjoerd, Nicolaas Lambertus ,  CASTELIJNS, Henricus, Jozef

IPC: B08B3/04

Abstract: A method (500) for cleaning an article such as a EUV (extreme ultraviolet) lithography reticle is provided. The method includes evacuating a cleaning chamber and loading the article to be cleaned into the cleaning chamber (510); preparing the environment of the chamber (520) by connecting the cleaning chamber to a vapor source while controlling pressure in the cleaning chamber to a predetermined pressure; controlling a temperature of the article relative to a temperature of the vapor source so as to form a liquid film (530) over the article and over particles present on the article; isolating the cleaning chamber from the vapor source; evaporating the liquid film (540) by exposing the cleaning chamber to one or more condensing surfaces whose temperature is lower than that of the article, the evaporating liquid transporting at least a portion of the particles away from the article, which is then unloaded from the chamber (560). The cleaning steps (520 to 540) can be repeated (550) as desired.