公开(公告)号：WO1995024054A1

公开(公告)日：1995-09-08

申请号：PCT/US1995002793

申请日：1995-02-28

Applicant: RODEL, INC.

Inventor： RODEL, INC. ,  BRANCALEONI, Gregory ,  WANG, Jiun-Fang

IPC: H01L21/306

CPC classification number: C09G1/02

Abstract: A composition is provided for polishing dielectric/metal composites, semiconductors and integrated circuits which contains an iodate compound. The iodate oxidizer may be used along with a compound or compounds which suppress the removal of the dielectric silica in the composite to provide an excellent selectivity of metal versus silica removal.

Abstract translation: 提供了用于抛光含有碘酸盐化合物的介电/金属复合材料，半导体和集成电路的组合物。 碘酸盐氧化剂可以与抑制复合材料中电介质二氧化硅去除的化合物或化合物一起使用，以提供金属与二氧化硅去除的优异选择性。

公开(公告)号：WO1998013218A1

公开(公告)日：1998-04-02

申请号：PCT/US1997017503

申请日：1997-09-26

Applicant: RODEL, INC.

Inventor： RODEL, INC. ,  HOSALI, Sharath, D. ,  SETHURAMAN, Anantha, R. ,  WANG, Jiun-Fang ,  COOK, Lee, Melboure

IPC: B44C01/22

CPC classification number: C09K3/1463 ,  C03C19/00 ,  H01L21/31055

Abstract: A composition is provided for polishing a composite comprised of silica and silicon nitride comprising: an aqueous medium, abrasive particles, a surfactant, and a compound which complexes with the silica and silicon nitride wherein the complexing agent has two or more functional groups each having a dissociable proton, the functional groups being the same or different.

Abstract translation: 提供了一种用于抛光由二氧化硅和氮化硅组成的复合材料的组合物，包括：水性介质，磨料颗粒，表面活性剂和与二氧化硅和氮化硅复合的化合物，其中络合剂具有两个或更多个各自具有 可离解质子，官能团相同或不同。

公开(公告)号：WO1997047430A1

公开(公告)日：1997-12-18

申请号：PCT/US1997002725

申请日：1997-02-26

Applicant: RODEL, INC.

Inventor： RODEL, INC. ,  COSSABOON, David ,  WANG, Jiun-Fang ,  COOK, Lee, Melbourne

IPC: B24B01/00

CPC classification number: C09G1/02

Abstract: A composition is provided, which is suitable for polishing SiO2, silicates, and silicon nitride, comprising an aqueous slurry of submicron SiO2 particles and a soluble inorganic salt or combination of soluble inorganic salts of total solution concentration below the critical coagulation concentration for the slurry, wherein the slurry pH is adjusted to within the range of about 9 to 10 by addition of a soluble amine or mixture of soluble amines. Optionally, the compositions of this invention may also comprise a polyhydric alcohol.

Abstract translation: 提供了一种组合物，其适用于抛光SiO 2，硅酸盐和氮化硅，其包含亚微米SiO 2颗粒的水性浆料和总溶液浓度的可溶性无机盐或可溶性无机盐的混合物低于浆料的临界凝结浓度， 其中通过加入可溶性胺或可溶性胺的混合物将浆液pH调节至约9至10的范围内。 任选地，本发明的组合物还可以包含多元醇。

公开(公告)号：WO1997013889A1

公开(公告)日：1997-04-17

申请号：PCT/US1996016425

申请日：1996-10-04

Applicant: RODEL, INC.

Inventor： RODEL, INC. ,  WANG, Jiun-Fang ,  SETHURAMAN, Anantha ,  WANG, Huey-Ming ,  COOK, Lee, Melbourne

IPC: C23F01/00

CPC classification number: C09K3/1463 ,  C09G1/02 ,  C09K3/1409 ,  C23F3/00

Abstract: An aqueous slurry is provided for polishing or planarizing a workpiece which contains a metal, the solids portion of said slurry being comprised of about 1 to about 50 percent by weight of submicron alpha-alumina, the remainder of the solids being of a substantially less abrasive composition chosen from one or more of the group consisting of aluminum hydrates, aluminum hydroxides, gamma-alumina, delta-alumina, amorphous alumina, and amorphous silica. Also provided is a method for polishing the surface of a work piece which contains a metal wherein said aqueous slurry is used as the polishing composition during chemical-mechanical polishing.

Abstract translation: 提供含水浆料用于抛光或平面化包含金属的工件，所述浆料的固体部分由约1-约50重量％的亚微米α-氧化铝组成，其余的固体物质基本上较少的磨料 选自一种或多种由水合铝，氢氧化铝，γ-氧化铝，δ-氧化铝，无定形氧化铝和无定形二氧化硅组成的组合物。 还提供了一种用于抛光含有金属的工件的表面的方法，其中所述水性浆料在化学机械抛光期间用作抛光组合物。

公开(公告)号：WO1995003252A1

公开(公告)日：1995-02-02

申请号：PCT/US1994008162

申请日：1994-07-20

Applicant: RODEL, INC.

Inventor： RODEL, INC. ,  WANG, Jiun-Fang

IPC: C01F17/00

CPC classification number: B82Y30/00 ,  C01F17/0043 ,  C01P2002/60 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/60 ,  C09K3/1409

Abstract: The invention is a process for preparing chemically active solid oxide particles useful for polishing, composed primarily of CeO2, or CeO2 together with other oxides, comprising: (a) forming an aqueous solution comprised of a water soluble trivalent cerium salt and an oxidizing agent, and (b) aging said mixture in the liquid state for a time not less than 4 hours.

Abstract translation: 本发明是一种制备用于抛光的化学活性固体氧化物颗粒的方法，主要由CeO 2或CeO 2与其它氧化物一起组成，其包括：（a）形成由水溶性三价铈盐和氧化剂组成的水溶液， 和（b）将液体状态下的所述混合物老化不少于4小时。