Abstract:
Novel continuous high speed techniques are provided to fabricate high aspect-ratio microscale structures by using curable liquid materials on a deformable polymeric substrate by a mold-guided pattern formation process with a rigid mold. Methods comprise contacting a patterned surface of a rigid mold with a curable liquid material disposed on a moldable polymeric substrate. The patterned surface has one or more cavities defining at least one microscale feature, so that the curable liquid material flows into the cavity and the major surface is at least partially deformed during the contacting. The liquid is cured to form a cured polymer having the at least one microscale feature over the moldable polymeric substrate.
Abstract:
Nanoscale grating structure can be utilized in many practical applications in optics, flat-panel displays and bio-sensors. A Dynamic Nano-Inscribing (Dynamic Nano-Inscribing) technique is disclosed for directly creating large-area, truly continuous nano-grating patterns in a variety of metal or polymer materials with feature size down to sub-50 nm and at very high speed (10 cm/sec). Dynamic Nano-Inscribing is carried out under either ambient temperature or with a brief heating time on the order of ten microseconds, which minimizes damage on UV or thermo-sensitive functional materials.