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    METHOD FOR MANUFACTURING RE-ENTRANT MICROSTRUCTURES
    1.
    发明申请
    METHOD FOR MANUFACTURING RE-ENTRANT MICROSTRUCTURES 审中-公开
    制造重新加入微结构的方法

    公开(公告)号：WO2016122959A2

    公开(公告)日：2016-08-04

    申请号：PCT/US2016/014285

    申请日：2016-01-21

    Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA

    Inventor： XU, Muchen ,  KIM, Chang-Jin

    IPC: B81C1/00 ,  B81C3/00

    CPC classification number: B81C1/00373 ,  B29C33/42 ,  B29C33/44 ,  B29C33/64 ,  B81B2207/056 ,  B81C1/00111 ,  B81C1/00357 ,  B81C1/00555 ,  B81C99/0085 ,  B81C2201/0198 ,  B81C2201/036 ,  B81C2203/0136 ,  B81C2203/036 ,  B81C2203/0757

    Abstract: A method of making microstructures having re-entrant or doubly re-entrant topology includes forming a mold defining the negative surface features of the re-entrant or doubly re-entrant topology that is to be formed. In one embodiment, a soft or flowable material is formed on a first substrate and the mold is contacted with the same to form a solid, now positive surface having the re-entrant or doubly re-entrant topology. The mold is then released from the first substrate. The microstructures are secured to a second, different substrate, and the first substrate is removed. Any residual microstructure material located between adjacent microstructures may be removed to form the separate microstructures on the second substrate. The second substrate may be thin and flexible any manipulated into useful or desired shapes having the microstructures on one side thereof.

    Abstract translation: 制造具有重入或双重拓扑结构的微结构的方法包括形成限定待形成的入侵或双重拓扑结构的负表面特征的模具。 在一个实施例中，软的或可流动的材料形成在第一基底上，并且模具与其接触以形成具有入侵或双重拓扑结构的固体，现在正的表面。 然后将模具从第一基底释放。 微结构被固定到第二不同的衬底上，并且去除第一衬底。 可以去除位于相邻微结构之间的任何残余微结构材料，以在第二基底上形成单独的微结构。 第二基底可以是薄且柔性的，任何被操纵成有用或期望的形状，其一侧具有微结构。

    CONTROLLED FABRICATION OF NANOPORES IN NANOMETRIC SOLID STATE MATERIALS
    2.
    发明申请
    CONTROLLED FABRICATION OF NANOPORES IN NANOMETRIC SOLID STATE MATERIALS 审中-公开
    纳米固体纳米材料在纳米固体材料中的可控制备

    公开(公告)号：WO2012125770A3

    公开(公告)日：2012-12-20

    申请号：PCT/US2012029132

    申请日：2012-03-14

    Applicant: HARVARD COLLEGE ,  RUSSO CHRISTOPHER J ,  GOLOVCHENKO JENE A ,  BRANTON DANIEL

    Inventor： RUSSO CHRISTOPHER J ,  GOLOVCHENKO JENE A ,  BRANTON DANIEL

    IPC: B81C1/00 ,  G01N33/487

    CPC classification number: B81B1/002 ,  B81B2201/0214 ,  B81B2203/0127 ,  B81B2207/056 ,  B81C1/00087 ,  G01N33/48721

    Abstract: In a method of forming a nanopore in a nanometric material, a nanopore nucleation site is formed at a location that is interior to lateral edges of the nanometric material by directing a first energetic beam, selected from the group of ion beam and neutral atom beam, at the interior location for a first time duration that imposes a first beam dose which causes removal of no more than five interior atoms from the interior location to produce at the interior location a nanopore nucleation site having a plurality of edge atoms. A nanopore is then formed at the nanopore nucleation site by directing a second energetic beam, selected from the group consisting of electron beam, ion beam, and neutral atom beam, at the nanopore nucleation site with a beam energy that removes edge atoms at the nanopore nucleation site but does not remove bulk atoms from the nanometric material.

    Abstract translation: 在纳米材料中形成纳米孔的方法中，通过引导选自离子束和中性原子束的第一能量束，在纳米材料的横向边缘内部的位置处形成纳米孔成核位点， 在内部位置持续第一时间持续时间，该第一时间持续时间施加第一射束剂量，该第一射束剂量导致从内部位置移除不超过五个内部原子以在内部位置处产生具有多个边缘原子的纳米孔成核位点。 然后，通过在纳米孔成核位点处引导选自电子束，离子束和中性原子束的第二高能束，以及在该纳米孔处去除边缘原子的束能量，在纳米孔成核位点处形成纳米孔 成核位点，但不会从纳米材料中除去大量原子。

    固态孔阵及其制作方法
    6.
    发明申请
    固态孔阵及其制作方法 审中-公开

    公开(公告)号：WO2014000332A1

    公开(公告)日：2014-01-03

    申请号：PCT/CN2012/079388

    申请日：2012-07-31

    Applicant: 中国科学院微电子研究所 ,  董立军 ,  赵超

    Inventor： 董立军 ,  赵超

    IPC: B81C1/00 ,  B82Y40/00

    CPC classification number: B81C1/00087 ,  B81B2207/056

    Abstract: 一种固态孔阵及其制作方法，其中固态孔阵的制作方法包括：在衬底的顶面和底面上分别形成底部孔阵基底和顶部孔阵基底；在顶部孔阵基底中形成正面孔；在具有顶部孔阵基底的衬底上形成顶部保护层，并在底部孔阵基底上形成底部保护层；在底部孔阵基底和底部保护层中形成背面窗口；以及通过碱腐蚀蚀穿衬底，以使正面孔与背面窗口连通。此外，本公开还提供了一种固态孔阵。通过本公开的方法，增加了正面薄膜的强度，简化了工艺步骤，降低了成本，同时更适合大规模制造。

    PROCESSABLE SELF-ORGANIZING NANOPARTICLES
    7.
    发明申请
    PROCESSABLE SELF-ORGANIZING NANOPARTICLES 审中-公开
    可处理的自组装纳米粒子

    公开(公告)号：WO2013158183A3

    公开(公告)日：2013-12-12

    申请号：PCT/US2013023421

    申请日：2013-01-28

    Applicant: UNIV CARNEGIE MELLON ,  MATYJASZEWSKI KRZYSZTOF ,  BOCKSTALLER MICHAEL

    Inventor： MATYJASZEWSKI KRZYSZTOF ,  BOCKSTALLER MICHAEL

    IPC: B82B3/00 ,  B82B1/00

    CPC classification number: C08J3/02 ,  B81B2207/056 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  C08G83/003 ,  C08J3/005 ,  C08J2325/06 ,  C08J2333/12 ,  C08L25/06 ,  C08L33/12 ,  C08L101/005 ,  C08L2205/025

    Abstract: A method of forming a composition includes adding together a plurality of particle brush systems wherein each of the particle brush systems includes a particle and a polymer brush including a plurality of polymer chains attached to the particle. The plurality of polymer chains of the polymer brush exhibit two chain conformations as the degree of polymerization of the polymer chains increases so that the polymer brush includes a concentrated polymer brush region with stretched polymer chains and a semi-dilute polymer brush region with relaxed chains that is radially outside of the concentrated polymer brush region. The degree of polymerization of the polymer brush is no less than 10% less than a critical degree of polymerization and no more than 20% greater than the critical degree of polymerization. The critical degree of polymerization is defined as the degree of polymerization required to achieve a transition from the concentrated polymer brush region to the semi-dilute polymer brush region.

    Abstract translation: 形成组合物的方法包括将多个颗粒刷系统相加在一起，其中每个颗粒刷系统包括颗粒和聚合物刷，其包括附着到颗粒上的多个聚合物链。 当聚合物链的聚合度增加时，聚合物刷的多个聚合物链表现出两个链构象，使得聚合物刷包括具有拉伸聚合物链的浓缩聚合物刷区域和具有松弛链的半稀释聚合物刷区域 位于浓缩聚合物刷区域的径向外侧。 聚合物刷的聚合度不低于临界聚合度的10％且不低于临界聚合度的20％以上。 临界聚合度定义为实现从浓缩聚合物刷区域到半稀释聚合物刷涂区域的转变所需的聚合度。

    나노 패턴의 형성방법
    8.
    发明申请
    나노 패턴의 형성방법 审中-公开
    形成纳米图案的方法

    公开(公告)号：WO2013162174A1

    公开(公告)日：2013-10-31

    申请号：PCT/KR2013/002176

    申请日：2013-03-18

    Applicant: 한국기계연구원

    Inventor： 김동호 ,  권정대 ,  나종주

    IPC: B82B3/00 ,  C23C16/04 ,  C23C14/04 ,  C23F1/02 ,  H01L21/02

    CPC classification number: C23C14/185 ,  B81B2207/056 ,  B81C1/00031 ,  C03C15/00 ,  C03C2218/34 ,  C23C14/04 ,  H01L29/0665

    Abstract: 마스크층을 식각 보호층으로 이용하는 나노 패턴의 형성방법 및 이로부터 제조된 나노 구조물이 제공된다. 일 실시예에 따르면, 기판 상에 나노 응집 입자들을 포함하는 마스크층을 형성한다. 상기 마스크층은 상기 나노 응집 입자들 사이로 상기 기판을 노출하는 개구를 갖는다. 상기 마스크층을 식각 보호층으로 이용하여 상기 개구로부터 노출된 상기 기판의 표면을 선택적으로 식각하여, 상기 기판 상에 나노 패턴을 형성한다.

    Abstract translation: 提供了使用掩模层作为蚀刻保护层和由其制备的纳米结构形成纳米图案的方法。 根据一个实施方案，在基材上形成包含聚集的纳米颗粒的掩模层。 掩模层具有在聚集的纳米颗粒中暴露基底的孔。 通过使用掩模层作为蚀刻保护层选择性地蚀刻从孔暴露的基板的表面，在基板上形成纳米图案。

    NANOCHANNEL-GUIDED PATTERNING FOR POLYMERIC SUBSTRATES
    9.
    发明申请
    NANOCHANNEL-GUIDED PATTERNING FOR POLYMERIC SUBSTRATES 审中-公开
    用于聚合物基板的纳米通道导向图案

    公开(公告)号：WO2012167076A2

    公开(公告)日：2012-12-06

    申请号：PCT/US2012040454

    申请日：2012-06-01

    Applicant: UNIV MICHIGAN ,  OK JONG G ,  AHN SE HYUN ,  GUO LINGJIE JAY

    Inventor： OK JONG G ,  AHN SE HYUN ,  GUO LINGJIE JAY

    IPC: B82B3/00 ,  B29C59/04 ,  C08J5/00 ,  C23C14/24

    CPC classification number: G03F7/0002 ,  B81B2207/056 ,  B81C1/0046 ,  B82Y10/00 ,  B82Y40/00 ,  C08J3/24 ,  C08J2300/24 ,  C08J2363/00 ,  G02B5/1809 ,  G02B5/1852 ,  G02B5/3058

    Abstract: Novel continuous high speed techniques are provided to fabricate high aspect-ratio microscale structures by using curable liquid materials on a deformable polymeric substrate by a mold-guided pattern formation process with a rigid mold. Methods comprise contacting a patterned surface of a rigid mold with a curable liquid material disposed on a moldable polymeric substrate. The patterned surface has one or more cavities defining at least one microscale feature, so that the curable liquid material flows into the cavity and the major surface is at least partially deformed during the contacting. The liquid is cured to form a cured polymer having the at least one microscale feature over the moldable polymeric substrate.

    Abstract translation: 提供了新的连续高速技术，以通过使用刚性模具的模具引导图案形成方法，在可变形聚合物基底上使用可固化液体材料来制造高纵横比微结构。 方法包括将刚性模具的图案化表面与设置在可模制聚合物基底上的可固化液体材料接触。 图案化表面具有限定至少一个微细特征的一个或多个空腔，使得可固化液体材料流入空腔中，并且主表面在接触期间至少部分变形。 将液体固化以形成在可模制的聚合物基材上具有至少一个微观特征的固化的聚合物。

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