公开(公告)号：WO2017210320A1

公开(公告)日：2017-12-07

申请号：PCT/US2017/035251

申请日：2017-05-31

Applicant: VIEW, INC.

Inventor： PARKER, Ronald, M. ,  PRADHAN, Anshu, A. ,  DIXIT, Abhishek, Anant ,  DAUSON, Douglas

IPC: C03C17/36 ,  H01B5/14 ,  G02F1/15 ,  C03C23/00

Abstract: Methods for protecting transparent electronically conductive layers on glass substrates are described herein. Methods include depositing a sacrificial coating during deposition of the transparent electronically conductive layer, before packing the glass substrate for storage or shipping, after unpacking glass substrates from a stack of glass substrates, and/or after a washing operation prior to fabricating an electrochromic stack on the transparent electronically conductive layer. Methods also include removing the sacrificial coating during a washing operation, during tempering, or prior to depositing an electrochromic stack by, e.g., heating the sacrificial coating or exposing the sacrificial coating to an inert plasma.

Abstract translation: 本文描述了用于保护玻璃基板上的透明电子导电层的方法。 方法包括在沉积透明电子导电层期间，在填充玻璃基板以供存储或运输之前，在从玻璃基板的堆叠中取出玻璃基板之后和/或在制造电致变色堆叠之前的洗涤操作之后沉积牺牲涂层 透明电子导电层。 方法还包括在洗涤操作期间，在回火期间或在沉积电致变色堆叠之前通过例如加热牺牲涂层或将牺牲涂层暴露于惰性等离子体来去除牺牲涂层。

公开(公告)号：WO2017218705A1

公开(公告)日：2017-12-21

申请号：PCT/US2017/037552

申请日：2017-06-14

Applicant: VIEW, INC.

Inventor： PARKER, Ronald, M. ,  PRADHAN, Anshu, A. ,  DIXIT, Abhishek, Anant ,  DAUSON, Douglas

IPC: G02F1/15 ,  G02F1/155

CPC classification number: G02F1/155 ,  G02F1/1523 ,  G02F1/153 ,  G02F1/1533 ,  G02F1/161 ,  G02F2001/1536 ,  G02F2001/1555

Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.

Abstract translation: 提供用于制造电致变色器件的方法，所述电致变色器件在顶部汇流条下形成短路而不预先确定将在该设备上施加顶部汇流条的位置。 使用这种方法制造的器件可以在顶部母线下面被去激活，或者可以在顶部母线下面包括活性材料。 在顶部母线下方制造具有活性材料的器件的方法包括沉积改性顶部母线，在电致变色器件中制造自修复层，并且在施加母线之前修改器件的顶部透明导电层。

公开(公告)号：WO2013138535A1

公开(公告)日：2013-09-19

申请号：PCT/US2013/031098

申请日：2013-03-13

Applicant: VIEW, INC. ,  FRIEDMAN, Robin ,  KAILASAM, Sridhar ,  MULPURI, Rao ,  PARKER, Ronald, M. ,  POWELL, Ronald, A. ,  PRADHAN, Anshu ,  ROZBICKI, Robert, T. ,  KHOSLA, Vinod

Inventor： FRIEDMAN, Robin ,  KAILASAM, Sridhar ,  MULPURI, Rao ,  PARKER, Ronald, M. ,  POWELL, Ronald, A. ,  PRADHAN, Anshu ,  ROZBICKI, Robert, T. ,  KHOSLA, Vinod

IPC: G02F1/15

CPC classification number: G02F1/1523 ,  B01J19/121 ,  B05D3/12 ,  C03C23/0025 ,  G01R31/08 ,  G02F1/0147 ,  G02F1/1309 ,  G02F1/15 ,  G02F1/153 ,  G02F1/1533 ,  G02F1/163 ,  G02F2001/1515 ,  G02F2201/508 ,  Y10T156/10

Abstract: Methods, apparatus, and systems for mitigating pinhole defects in optical devices such as electrochromic windows. One method mitigates a pinhole defect in an electrochromic device by identifying the site of the pinhole defect and obscuring the pinhole to make it less visually discernible. In some cases, the pinhole defect may be the result of mitigating a short-related defect.

Abstract translation: 用于减轻诸如电致变色窗口的光学装置中的针孔缺陷的方法，装置和系统。 一种方法通过识别针孔缺陷的位置并遮蔽针孔以减少视觉辨识，从而减轻电致变色器件中的针孔缺陷。 在某些情况下，针孔缺陷可能是减轻短路相关缺陷的结果。

公开(公告)号：WO2013003065A3

公开(公告)日：2013-01-03

申请号：PCT/US2012/042514

申请日：2012-06-14

Applicant: VIEW, INC. ,  PARKER, Ronald, M. ,  ROZBICKI, Robert, T.

Inventor： PARKER, Ronald, M. ,  ROZBICKI, Robert, T.

IPC: C23C14/34

Abstract: The present disclosure concerns sputter targets and sputtering methods. In particular, sputter targets and methods of sputtering using conventional sputter targets as well as sputter targets described herein, for highly uniform sputter deposition, are described.