公开(公告)号：WO2013167596A1

公开(公告)日：2013-11-14

申请号：PCT/EP2013/059496

申请日：2013-05-07

Applicant: VRIJE UNIVERSITEIT BRUSSEL ,  UNIVERSITE LIBRE DE BRUXELLES

Inventor： DE GRAEVE, Iris ,  TERRYN, Herman ,  RENIERS, François ,  DE VOS, Caroline

IPC: B05D7/14 ,  C09D5/08 ,  B05D1/00

CPC classification number: C23F11/02 ,  B05D1/62 ,  B05D7/14 ,  B05D2202/25 ,  B05D2490/50 ,  C23F13/005 ,  C23F13/02 ,  Y10T428/31678

Abstract: The present invention is related to a method for protecting a metal substrate against corrosion comprising the step of: -generating a plasma in a gaseous medium by means of a plasma device; -placing the substrate in contact with the plasma, or in a post-plasma area of said plasma; -introducing in said plasma or in said post-plasma area a corrosion inhibitor along with an organic precursor, thereby depositing a barrier layer comprising the corrosion inhibitor, the deposited layer protecting the metal substrate against corrosion.

Abstract translation: 本发明涉及一种用于保护金属基材免受腐蚀的方法，包括以下步骤： - 通过等离子体装置在气态介质中产生等离子体; 使衬底与等离子体接触，或在所述等离子体的后等离子体区域中; - 在所述等离子体或所述后等离子体区域中引入腐蚀抑制剂以及有机前体，从而沉积包含所述腐蚀抑制剂的阻挡层，所述沉积层保护所述金属基底免受腐蚀。