公开(公告)号：WO2022272226A1

公开(公告)日：2022-12-29

申请号：PCT/US2022/072986

申请日：2022-06-16

Applicant: HERAEUS EPURIO LLC

Inventor： SHARMA, Ram B. ,  ZHANG, Yongqiang ,  JEWETT, Kyle ,  SAKAVUYI, Kaumba

IPC: C07C381/00 ,  G03F7/038 ,  G03F7/039 ,  C07C2602/42 ,  C07C309/10 ,  C07D327/06 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397

Abstract: A sulfonic acid derivative compound represented by Formula (I): (Formula (I)), wherein R is a substituted or unsubstituted C1-C12 alkyl group; and Z is selected from the group consisting of a substituted or unsubstituted polycyclic C3-C30 cycloalkyl group, a substituted or unsubstituted monocyclic C3-C30 cycloalkyl group, and a substituted or unsubstituted C3-C30 monocyclic heteroalkyl group. Compounds and compositions disclosed herein are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.