公开(公告)号：WO2022006053A1

公开(公告)日：2022-01-06

申请号：PCT/US2021/039522

申请日：2021-06-29

申请人： APPLIED MATERIALS, INC.

发明人： SONG, Jiao ,  CHAN, Anthony, Chih-Tung ,  GUNTHER, David ,  SAVANDAIAH, Kirankumar Neelasandra ,  WYSOK, Irena, H.

IPC分类号： C23C14/35 ,  C23C14/34 ,  C23C14/14 ,  H01J37/34 ,  C23C14/345 ,  C23C14/354 ,  H01J2237/332 ,  H01J37/3408 ,  H01J37/3455

摘要： Methods and apparatus for processing a substrate are provided herein. In embodiments, a magnetron assembly for use in a PVD chamber includes: a base plate having a first side, a second side opposite the first side, and a central axis; a magnet plate rotatably coupled to the base plate, wherein the magnet plate rotates with respect to the base plate about an offset axis; a magnet assembly coupled to the magnet plate offset from the offset axis and configured to rotate about the central axis and the offset axis; a first motor coupled to the base plate to rotate the magnet assembly about the central axis; and a second motor coupled to the magnet plate to control an angular position thereof and to position the magnet assembly in each of a plurality of fixed angular positions defining a plurality of different fixed radii.