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公开(公告)号：WO2023087577A1
公开(公告)日：2023-05-25
申请号：PCT/CN2022/079763
申请日：2022-03-08
Applicant: 苏州大学
Abstract: 本发明涉及一种纳米刀具涂层及其制备方法，本发明所述的纳米刀具涂层包括刀具基体以及依次在所述刀具基体表面沉积的过渡层、支撑层、界面层和功能顶层；所述过渡层为Ti过渡层；所述支撑层为TiAlTaN梯度涂层；所述界面层为WS2/TaO纳米多层涂层；所述功能顶层为TiAlN/WS2/TaO复合涂层，并在各层界面间通过飞秒激光技术引入纳米尺度的波纹结构调控层间结合强度，使刀具涂层整体呈现"硬-韧-硬"三层复合结构，实现力学性能与长效自润滑、减亲和功能多指标协同优化。
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公开(公告)号：WO2023063766A1
公开(公告)日：2023-04-20
申请号：PCT/KR2022/015569
申请日：2022-10-14
IPC: H01L29/43 , H01L21/285 , C23C14/58 , C23C14/14
Abstract: 본 발명은 초미세 반도체 소자의 구현을 가능하게 할 수 있는 복합 구조체에 관한 것으로, 상세하게 본 발명에 따른 복합 구조체는 이방성 원자 구조를 갖는 이차원 물질이 적층된 적층체 및 적층체의 일 표면으로부터 두께방향으로 전이금속 원자가 주기성을 가지고 위치하는 것으로부터 기인한 하나 이상의 전도성 채널을 포함한다.
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公开(公告)号：WO2023062454A1
公开(公告)日：2023-04-20
申请号：PCT/IB2022/058332
申请日：2022-09-05
Applicant: ARCELORMITTAL
Inventor： RUWET, Vincent , PACE, Sergio , GILLET, Océane
Abstract: The invention relates to a vapour jet coater for depositing, on a running substrate, coatings formed from metal or metal alloy, said vapour jet coater comprising successively : - a repartition chamber, configured to be connectable to an evaporation pipe, and - a vapour outlet orifice, connected to said repartition chamber and able to eject a metal alloy vapour along a main ejection plan and a main ejection direction, comprising successively i. a converging section, ii. a diverging section.
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公开(公告)号：WO2023047948A1
公开(公告)日：2023-03-30
申请号：PCT/JP2022/033453
申请日：2022-09-06
Applicant: 東海光学株式会社
Abstract: 【課題】微細な凹凸構造を有しながら、熱によるクラックの発生がより抑制されて、より耐熱性に優れる光学製品、及びその光学製品を容易に作成可能な製造方法を提供する。 【解決手段】光学製品１は、基材２と、その成膜面Ｆに形成される光学膜４と、を備えている。光学膜４は、微細な凹凸構造と、基材２に接する空孔６と、を有している。微細な凹凸構造は、毛羽状構造、ピラミッド群状構造、及び剣山状構造の少なくとも何れかであっても良い。又、光学膜４は、ＡｌＯｙ（０＜ｙ＜１．５）及びＳｉＯｚ（０＜ｚ＜２）を含んでいても良い。
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公开(公告)号：WO2023035955A1
公开(公告)日：2023-03-16
申请号：PCT/CN2022/114641
申请日：2022-08-25
Applicant: 惠州市拓普金属材料有限公司
Abstract: 一种银合金靶材，银合金靶材由银、铟和钪组成；银合金靶材中铟的质量百分含量为0.2％～1％，钪的质量百分含量为0.005％～0.15％，其余为银。还公开了一种银合金靶材的制备方法，银合金靶材在制备银薄膜中的应用及银合金靶材在制备ITO/Ag/ITO薄膜中的应用。
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Patent Agency Ranking
公开(公告)号：WO2023022849A1
公开(公告)日：2023-02-23
申请号：PCT/US2022/038176
申请日：2022-07-25
Applicant: TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
Inventor： NIIMI, Hiroaki , LEUSINK, Gerrit , MAEHARA, Hiroki , ABARRA, Noel , WATANABE, Naoki
IPC: H01L21/285 , H01L21/3205 , H01L21/768 , C23C14/14
Abstract: A method of forming a metal superlattice structure includes depositing, on a substrate, a layer of a first metal with face-centered-cubic (fcc) crystal structure. The method further includes depositing a layer of ruthenium (Ru) metal with fcc crystal structure on the layer of the first metal. The layer of the first metal may cause the layer of ruthenium metal to have fcc crystal structure.
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公开(公告)号：WO2023006660A1
公开(公告)日：2023-02-02
申请号：PCT/EP2022/070783
申请日：2022-07-25
Applicant: OSMOTEX AG , HELDAL, Trond , ÖZTÜK, Emin
Inventor： HELDAL, Trond
IPC: D06M16/00 , A41D13/11 , B32B5/02 , B32B7/10 , B32B7/12 , C23C14/14 , D06M11/83 , D06M17/00 , A41D31/30 , A61F13/00 , A61L15/00 , D06M11/73 , D06M23/08 , A61L9/014 , A01N59/20 , A01N55/02 , D06M101/40
Abstract: A layered disinfecting structure comprising a first activated carbon layer and a second layer, wherein the second layer contains a metal coating between 10 nm and 20 micrometer in average thickness. The slow release of metal from the second layer will result in the spreading of metal or metal ions over the carbon area, resulting in a strong disinfecting effect.
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公开(公告)号：WO2022251205A1
公开(公告)日：2022-12-01
申请号：PCT/US2022/030713
申请日：2022-05-24
Applicant: VACTRONIX SCIENTIFIC, LLC
Inventor： CARPENTER, Scott
Abstract: Ternary and quaternary shape memory alloys, particularly nickel-titanium based quaternary and quaternary shape memory alloys, are disclosed and made by a method employing physical vapor deposition (PVD), such as by sputtering, of NiTiX, wherein X is a ternary metal constituent. By employing PVD processing, ternary and quaternary NiTi alloy bulk materials may be made in in the as-deposited state such that the configuration and conformation of a desired precursor material, e.g., wires, tubes, planar materials, curvilinear, or as the near finished end product, such as a hypotube for stent manufacture, semilunar for cardiac valves or conical for embolic or caval filters, is formed on a removable deposition substrate in the configuration and conformation of the precursor material or near-finished end product.
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9.发明申请
公开(公告)号：WO2022175703A1
公开(公告)日：2022-08-25
申请号：PCT/IB2021/051284
申请日：2021-02-16
Applicant: APPLIED MATERIALS, INC. , AULBACH, Julian , MÜLLER, Andreas , FRANKE, Sebastian , SPATZ, Norbert , SCHÜSSLER, Uwe
Inventor： AULBACH, Julian , MÜLLER, Andreas , FRANKE, Sebastian , SPATZ, Norbert , SCHÜSSLER, Uwe
Abstract: A material deposition assembly for depositing a material on a substrate in a vacuum deposition chamber is described. The material deposition assembly includes at least one material deposition source. The deposition source includes a distribution pipe configured for directing evaporated material to the substrate, the distribution pipe having a counterpart flange with a counterpart spheroid surface being rotational symmetric about an axis of circular symmetry, the counterpart spheroid surface having a first height along the axis. The deposition source includes a crucible to evaporate the material, the crucible having a flange with a spheroid surface being rotational symmetric about the axis, the spheroid surface having a second height along the axis, wherein the second height is different from the first height, particularly the second height is different by at least 20% relative to the first height.
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公开(公告)号：WO2022163719A1
公开(公告)日：2022-08-04
申请号：PCT/JP2022/002929
申请日：2022-01-26
Applicant: 京セラ株式会社
Abstract: 本開示による被覆工具は、基体と、基体の上に位置する被覆層と、を有する。被覆工具は、すくい面を有する第１面と、逃げ面を有する第２面と、第１面および第２面の間に位置する稜線部とを有する。稜線部の少なくとも一部には切刃が位置する。切刃は、少なくとも一部に第３面を有している。被覆層は、少なくとも、第２面に位置する第２被覆層と、第３面に位置する第３被覆層とを有する。第２被覆層と第２面との密着力を第２密着力とし、第３被覆層と第３面との密着力を第３密着力とした場合、第３密着力は、第２密着力よりも小さい。
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