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发明公开
CN101047140A 基板传送装置、基板处理装置和基板处理方法 无效 - 撤回

基板传送装置、基板处理装置和基板处理方法
摘要：
一种能够限制颗粒产生的基板传送装置。该基板传送装置(1)包括容纳晶片(W)的处理腔(12)、用于将晶片传送到处理腔中的传送臂(17)，和置于处理腔中并安装传送晶片的基座(45)。带有多个突起(55a)的静电夹盘(55)置于基座的上部内。带有多个用于保持晶片的突起(25a)的传送叉(25)置于传送臂的末端上。这些突起(25a)设置在传送叉(25)中以使突起(25a)的晶片保持部(81)与静电夹盘的突起(55a)的晶片保持部分(80)不同。
摘要（英）：

A substrate transferring apparatus capable of suppressing particles from being produced. The substrate processing apparatus ( 1 ) includes a processing chamber ( 12 ) in which a wafer (W) is housed, a transfer arm ( 17 ) for transferring the wafer to the processing chamber, and a susceptor ( 45 ) which is disposed in the processing chamber and on which the transferred wafer is mounted. An electrostatic chuck ( 55 ) having a plurality of protrusions ( 55 a) is disposed In an upper portion of the susceptor. A transfer fork ( 25 ) having a plurality of protrusions ( 25 a) for holding a wafer is disposed on a distal end of the transfer arm. These protrusions ( 25 a) are provided in the transfer fork ( 25 ) such that wafer holding portions ( 81 ) by the protrusions ( 25 a) are different from wafer holding protrusions ( 80 ) by the protrusions ( 55 a) of the electrostatic chuck.

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