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Invention Grant
CN101213076B 具有减少的界面空洞的用于铜金属化的焊接点 有权

具有减少的界面空洞的用于铜金属化的焊接点
Abstract:
一种金属互连结构(100)包括接合衬垫(101)，所述接合衬垫具有铜，所述铜的至少70体积百分比由在晶粒主方向上扩展1μm以上的晶粒组成，且30或少于30体积百分比由在晶粒主结晶方向上扩展1μm以下的晶粒组成。锡合金主体(102)与所述接合衬垫接触。
Abstract(English):

A metal interconnect structure ( 100 ) comprising a bond pad ( 101 ), which has copper with at least 70 volume percent composed of crystal grains expanding more than 1 mum in their main direction, and 30 or less volume percent composed of crystal grains, which expand less than 1 mum in their main crystal direction. A body ( 102 ) of tin alloy is in contact with the bond pad.

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