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发明授权
CN101276157B 曝光绘图装置 失效 - 权利终止

曝光绘图装置
摘要：
本发明的课题是提供一种曝光绘图装置，搭载着少数光源和多个空间光调制组件，确保高的运转率，且可进行温度管理。其解决方式为，曝光绘图装置(100)包括：光源(10)，照射紫外线；第一照明光学系统(30)，使来自光源的光束形成为平行光；有孔构件(20)，设有用于将来自第一照明光学系统的光束分离成矩形的第一光束和矩形的第二光束的第一矩形窗(21)及第二矩形窗(21)；第一及第二空间光调制装置(41)，将在有孔构件中被分离的第一光束及第二光束进行空间调制；以及投影光学系统(60)，将在这些第一及第二空间光调制装置(41)中被空间调制的第一光束和第二光束引导至被曝光体。
摘要（英）：

The project of the invention provides an exposure drawing device which picks up a minority of light source and a plurality of spatial light modulation components so as to guarantee high running rate and can process temperature management. A method of solution is that: the exposure drawing device (100) comprises: the light source (10) for irradiating ultraviolet radiation; a first illumination system (30) making a beam from the light source form parallel light; a porose component (20) which is provided with a first rectangle window (21) and a second rectangle window (21) separating the beam from the first illumination system into a rectangle first beam and a rectangle second beam; a first and a second spatial light modulation device (41) processing spatial modulation for the separated first beam and second beam in the porose component; and a projection optical system (60) leading the first beam and the second beam which are spatially modulated in the first and the second spatial light modulation device (41) to an exposed body.

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