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发明公开
CN101312116A 结晶装置以及结晶方法 无效 - 撤回

结晶装置以及结晶方法
摘要：
本发明提供一种结晶装置，在此结晶装置中，可以使转印到被处理基板上的由光调制元件或金属光圈所形成的光强度分布可视。此结晶装置具有紫外光照射系统以及可见光照射系统，此紫外光照射系统将紫外光区的激光束脉冲照射到被处理基板上，此可见光照射系统对被处理基板上的与紫外光区的激光束的照射区域相同的照射区域，连续照射可见光激光束。在因均匀地照射紫外光区的激光束而熔化的区域中，利用可见光激光束的光强度分布来形成晶体成长。结晶装置通过脉冲照射紫外光区的激光束来使被处理基板熔化，并通过连续地照射可见光激光束来使被处理基板结晶化，由此二种方式的组合，使进行结晶处理的激光束可视化。
摘要（英）：

A crystallization apparatus is provided. In the crystallization apparatus, a light intensity distribution formed by a light modulation device or a metal aperture and transferred to a processed substrate can be visualized. The crystallization apparatus has an ultraviolet (UV) irradiation system and a visible light irradiation system. The UV irradiation system irradiates pulses of laser beam in the UV range to the processed substrate. The visible light irradiation system continuously irradiates a visible light laser beam on the same irradiated region on the processed substrate. In a melted region resulted from the uniform irradiation of the laser beam in the UV range, the light intensity distribution of the visible laser beam is used to form crystal growth. The crystallization apparatus irradiates pulses of the laser beam in the UV range to melt the processed substrate, and continuously irradiates the visible light laser beam to crystallize the processed substrate.

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