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发明授权
CN101398627B 涂敷处理方法、涂敷处理装置和计算机可读取的存储介质 有权

涂敷处理方法、涂敷处理装置和计算机可读取的存储介质
摘要：
本发明涉及涂敷处理方法、涂敷处理装置和计算机可读取的存储介质。一种基板的涂敷处理方法，具有：第一工序，在使基板旋转的状态下，从喷嘴向该基板的中心部喷出涂敷液，将涂敷液涂敷在基板上；第二工序，在第一工序之后，对基板的旋转减速，使基板持续旋转；第三工序，在第二工序之后，对基板的旋转加速，使基板上的涂敷液干燥，其中，在第一工序之前，以第一速度的恒定速度使基板旋转，在第一工序中，使在开始前具有第一速度的基板的旋转逐渐加速，以便在开始后其速度连续地变动，在结束时，使基板的旋转的加速度逐渐减少，使基板的旋转达到比第一速度快的第二速度。
摘要（英）：

The present invention includes: a first step of discharging a coating solution from a nozzle to a center portion of the substrate to apply the coating solution on a surface of the substrate while rotating the substrate; a second step of decelerating, after the first step, the rotation of the substrate and continuously rotating the substrate; and a third step of accelerating, after the second step, the rotation of the substrate to dry the coating solution on the substrate, wherein: the substrate is rotated at a fixed speed of a first speed immediately before the first step; and in the first step, the rotation of the substrate which is at the first speed before start of the first step is gradually accelerated after the start of the first step so as to make the speed continuously change, andthe acceleration of the rotation of the substrate is gradually decreased so as to make the speed of the rotation of the substrate converge in a second speed higher than the first speed at end of the first step.

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