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发明公开
CN101421814A 用于离子植入均匀度的离子束扫描控制方法及系统 有权

用于离子植入均匀度的离子束扫描控制方法及系统
摘要：
本发明的实施例是关于一种用于调整被扫描离子射束的带状射束通量的方法。于此方法中，会以一扫描速率来扫描离子射束，而且会在扫描该离子射束时来测量多个动态射束轮廓。经修正的扫描速率会依据该被扫描离子射束的该多个经测量动态射束轮廓而被算出。该离子射束会以该经校正的扫描速率来扫描，以便产生经修正的带状离子射束。本发明还揭示其它方法与系统。
摘要（英）：

One embodiment of the invention relates to a method for adjusting the ribbon beam flux of a scanned ion beam. In this method, an ion beam is scanned at a scan rate, and a plurality of dynamic beam profiles are measured as the ion beam is scanned. A corrected scan rate is calculated based on the plurality of measured dynamic beam profiles of the scanned beam. The ion beam is scanned at the corrected scan rate to produce a corrected ribbon ion beam. Other methods and systems are also disclosed.

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