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发明公开
CN101798168A 制造用于受激准分子激光的合成石英玻璃的方法 有权

制造用于受激准分子激光的合成石英玻璃的方法
摘要：
本发明公开了一种制造用于受激准分子激光的合成石英玻璃的方法，该方法通过如下方式来制造上述合成石英玻璃：在靶上沉积氧化硅颗粒以形成多孔氧化硅母材，所述氧化硅颗粒通过使氧化硅原材料在真空烧结炉中的氢氧焰中气相水解或氧化分解得到；将所述多孔氧化硅母材玻璃化；并对玻璃化的材料进行热成型、退火处理及氢掺杂处理，其中多孔氧化硅母材的玻璃化包括：(a)在400℃以上、且低于900℃的温度范围，将真空压力保持在20.0Pa以下的步骤；(b)在900℃以上、且低于1100℃的温度范围，将真空压力保持在10.0Pa以下的步骤；及(c)在1100℃至透明玻璃化温度的温度范围，将真空压力保持在3.0Pa以下的步骤。
摘要（英）：

Disclosed is a method of producing a synthetic quartz glass for excimer laser by depositing on a target silica particulates obtained by subjecting a silica raw material to vapor-phase hydrolysis or oxidative decomposition in an oxyhydrogen flame in a vacuum sintering furnace to form a porous silica base material, vitrifying the porous silica base material, and subjecting the vitrified material to hot forming, an annealing treatment and a hydrogen doping treatment, wherein the vitrification of the porous silica base material includes: (a) a step of holding a vacuum pressure at or below 20.0 Pa in a temperature range from 400 DEG C., inclusive, to 900 DEG C., exclusive; (b) a step of holding a vacuum pressure at or below 10.0 Pa in a temperature range from 900 DEG C., inclusive, to 1100 DEG C., exclusive; and (c) a step of holding a vacuum pressure at or below 3.0 Pa in a temperature range from 1100 DEG C. to a transparent-vitrification temperature.

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