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发明公开
CN102047438A 用于11(IB)族-13(IIIA)族-16(VIA)族元素的金属、二元、三元、四元或五元合金沉积的电镀添加剂 失效 - 权利终止

用于11(IB)族-13(IIIA)族-16(VIA)族元素的金属、二元、三元、四元或五元合金沉积的电镀添加剂
摘要：
本发明涉及用于11(IB)族金属/二元或三元11(IB)族-13(IIIA)族/三元、四元或五元11(IB)族-13(IIIA)族-16(VIA)族合金在薄膜太阳能电池用基材上沉积的电镀添加剂。该添加剂具有通式(A)，其中X1和X2可以相同或不同，且选自亚芳基和亚杂芳基；FG1和FG2可以相同或不同，或者选自-S(O)2OH、-S(O)OH、-COOH、-P(O)2OH和伯胺、仲胺和叔胺基团及其盐和酯；R选自亚烷基、亚芳基或亚杂芳基，且n和m为1-5的整数。式(A)
摘要（英）：

The invention relates to electroplating additives for the deposition of a group11(IB) metal/binary or ternary group 11(IB)-group13(IIIA)ternary, quaternary or pentanary group 11(IB)-group13(IllA)-group16(VIA)-alloy on substrates useful for thin film solar cells. The additives have the general formula (A): wherein X1 and X2 may be the same or different and are selected from the group consisting ofarylene and heteroarylene; FG1 and FG2 may be the same or different or are selected from the group consisting of -S(O)2OH, -S(O)OH, -COOH, -P(O)2OH and primary, secondary and tertiary amino groups and salts and esters thereof; R is selected from the group consisting of alkylene, arylene or heteroarylene and n and m are integers from 1 to 5.

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