The invention provides a furnace tube retaining plate structure and a manufacturing method thereof. The furnace tube retaining plate structure comprises a silicon substrate, a silicon nitride layer arranged on the silicon substrate and a silicon dioxide layer arranged on the silicon nitride layer. The silicon nitride layer is formed on the silicon substrate to form a silicon-silicon nitride structure, and a silicon dioxide layer is formed on the silicon-silicon nitride structure to obtain a silicon-silicon nitride-silicon dioxide structure. A furnace tube retaining plate with a special structure can eliminate influences of the retaining plate on production piece film thickness, so that good uniformity among pieces of films obtained on product pieces can be realized, and normal utilization and recovery of the retaining plate are unaffected. The furnace tube retaining plate is structurally characterized in that the structure of silicon-silicon nitride is covered by silicon dioxide, so that the furnace tube retaining plate and the surface of the product pieces are identical in materials, deposition rate difference during deposition is eliminated, and better intra-piece uniformity of the product pieces is obtained.