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发明公开
CN103123895A 应变层的松弛 有权

应变层的松弛
摘要：
应变层的松弛。本发明涉及一种用于松弛应变材料层的方法，该方法包括以下步骤：在籽晶衬底上生长所述应变材料层；在所述应变材料层的一面上沉积第一低粘度层；通过所述第一低粘度层将所述应变材料层粘合到第一衬底，并且将所述应变材料层从所述籽晶衬底分离；在所述应变材料层的另一面上沉积第二低粘度层；在热处理步骤之前将第二衬底粘合到所述第二低粘度层，以形成夹层结构；使所述夹层结构经受热处理，使得造成所述第一低粘度层和所述第二低粘度层的回流，由此至少部分地松弛所述应变材料层。
摘要（英）：

The present invention relates to a method for relaxing a strained material layer, comprising depositing a first low-viscosity layer comprising a first compliant material on the strained material layer, depositing a second low-viscosity layer comprising a second compliant material on the strained material layer to form a first sandwiched structure and subjecting the first sandwiched structure to a heat treatment such that reflow of the first and the second low-viscosity layers is caused thereby at least partly relaxing the strained material layer.

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