The invention discloses a detachable nozzle and device for manufacturing an atomic layer deposited film. The nozzle for manufacturing the atomic layer deposited film comprises an air inlet pipeline, an air inlet and an air outlet, wherein the air inlet, as well as the air outlet, has a cavity therein, the cavity is formed inside the air outlet and is divided into an upper half part and a lower half part between which a funneled structure is arranged; the air inlet pipeline is fixedly connected with the air inlet; the air inlet and the air outlet is in demountable sealing connection. The device used for manufacturing the atomic layer deposited film comprises nozzles, a cavity support frame, a substrate carrying table and a motion platform, wherein a strip-shaped hollow part is formed in the middle of the cavity support frame, the detachable nozzles can be sequentially arranged in the hollow part; the substrate carrying table is arranged below a cavity support frame and is driven by the motion platform. The nozzle and the device are suitable for deposition reaction of different atomic layers, can be used for quickly and effectively manufacturing the atomic layer deposited layers through a gas separation atomic layers deposition method.