利索-全球专利检索

  1. 登录
  2. 注册
发明公开
CN104253072A 基板处理装置 有权

基板处理装置
摘要：
一种基板处理装置，能正确检测出由流体支承的晶片等基板是否正确地处于规定的处理位置。该基板处理装置具有：擦洗器(50)，其使擦洗部件(61)与基板(W)的第1面滑动接触而对该基板(W)进行表面处理；静压支承机构(90)，其通过流体而非接触地支承基板的第2面，该第2面是第1面相反侧的面；距离传感器(103)，其对擦洗器(50)与静压支承机构(90)的距离进行测量；以及处理控制部(4)，其根据距离测量值算出静压支承机构(90)与基板(W)的第2面之间的间隙，并确定间隙是否处于规定的范围以内。
摘要（英）：

Disclosed is a substrate processing apparatus which is capable of detecting whether a substrate, such as a wafer, supported by a fluid is properly present in a predetermined processing position or not. The substrate processing apparatus includes at least one distance sensor configured to measure a distance between a scrubber and a hydrostatic support structure; and a processing controller configured to calculate a gap between the hydrostatic support structure and the surface of the substrate from a measured value of the distance and determine whether the gap falls within a predetermined range or not.

公开/授权文献
0/0