The invention discloses a film growth reaction chamber equipment real-time temperature measurement system self calibration device and belongs to the technical field of semiconductor manufacture. The device comprises an actual heat radiation ratio acquisition unit and a calibration coefficient calculation unit; the actual heat radiation ratio acquisition unit is used for acquiring an actual heat radiation ratio; the calibration coefficient calculation unit is used for arranging a point according to the actual heat radiation ratio on a theoretical heat radiation ratio-temperature curve trace, substituting the temperature value T corresponding to the point into a calculation formula, and acquiring calibration coefficients m1 and m2. By the aid of the device, the calibration coefficients m1 and m2 corresponding to a first wavelength lamda 1 and second wavelength lamda 2 of a dual wavelength temperature measurement structure can be acquired, the film growth reaction chamber equipment real-time temperature measurement system self calibration is implemented, and the consistence and accuracy of epitaxial film growth temperature measurement can be guaranteed.